2006
DOI: 10.1002/app.23212
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Photooxidation of benzil groups in the presence of hindered amine stabilizers in the polystyrene film

Abstract: ABSTRACT:The photoperoxidation at Ͼ 400 nm of benzil (BZ) groups with the air oxygen to benzoyl peroxide (BP) groups in the polystyrene matrices was investigated in the presence of hindered amine stabilizer (HAS). HAS was used as a free molecule or was bound in combined molecule with BZ. HAS was in the form of parent amine as 2,2,6,6-tetramethyl-4-hydroxypiperidine (TMP) and in the form of stable nitroxyl radical 1-oxo-2,2,6,6-tetramethyl-4-hydroxypiperidine (NO). Both HAS forms effected the photooxidation of … Show more

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Cited by 5 publications
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“…Therefore, both fluorescence and phosphorescence from BZ are dependent on external constraints imposed by the environment. Based upon the fact that the absorption maxima of BZ in toluene [ 23 ] and in a PS matrix [ 24 ] are both at 390 nm, we infer that the BZ ground state conformations are skewed to the same degree in the two media. The phosphorescence maximum of BZ in various solvents at 77 K (solids) is at ca.…”
Section: Photochemistry Of Benzil In Solution In the Absence Of Molecular Oxygenmentioning
confidence: 99%
“…Therefore, both fluorescence and phosphorescence from BZ are dependent on external constraints imposed by the environment. Based upon the fact that the absorption maxima of BZ in toluene [ 23 ] and in a PS matrix [ 24 ] are both at 390 nm, we infer that the BZ ground state conformations are skewed to the same degree in the two media. The phosphorescence maximum of BZ in various solvents at 77 K (solids) is at ca.…”
Section: Photochemistry Of Benzil In Solution In the Absence Of Molecular Oxygenmentioning
confidence: 99%