Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry

Huang, Jingyu; Dahlgren, David; Hemminger, John C.

doi:10.1021/la00015a005

Cited by 236 publications

(193 citation statements)

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“…Understanding the photoreactivity of SAMs is important for optimizing photoresist patterning processes involving SAMs. [7][8][9][10][11] As the feature sizes in lithography continue to scale down, there is an increasing demand on the resist films in terms of thickness and structural uniformity. [12][13][14][15] SAMs are an attractive candidate for nanoscale resists due to their molecular thickness and well-defined structure on nanometer length scales, which in principle should enable nanometer resolution in pattern transfer.…”

Section: Introductionmentioning

confidence: 99%

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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A molecular level understanding of the photoreactivity of self-assembled monolayers (SAMs) becomes increasingly important as the spatial resolution starts to be limited by the size of the resist and the spatial extent of the photochemical reactions in photoresist micropatterning. To this end, a number of surface characterization techniques were combined to understand the reactive agents, reactive sites, kinetics, and reaction pathways in the UV photoreactivity of octadecylsiloxane (ODS) SAMs. Quantitative analysis of our results provides evidence that ground state atomic oxygen is the primary reactive agent for the UV degradation of ODS SAMs. UV degradation, which follows zero-order kinetics, results in the scission of alkyl chains instead of the siloxane headgroups. Our results suggest that the top of the ODS SAMs is the preferential reactive site. Using a novel, highly surface sensitive technique, fluorescence labeling of surface species, we identified the presence of submonolayer quantities chemical functional groups formed by the UV degradation. These groups are intermediates in a proposed mechanism based on hydrogen abstraction.

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Section: Introductionmentioning

confidence: 99%

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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“…Without using templates, DNA micropatterns may be directly produced by using photolithography (12)(13)(14). Micropatterns of proteins have also been created by first making patterned surfaces as templates, followed by selective adsorption of proteins (15).…”

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confidence: 99%

Positioning protein molecules on surfaces: A nanoengineering approach to supramolecular chemistry

Liu

Amro

2002

Proc. Natl. Acad. Sci. U.S.A.

183

158

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We discuss a nanoengineering approach for supramolecular chemistry and self assembly. The collective properties and biofunctionalities of molecular ensembles depend not only on individual molecular building blocks but also on organization at the molecular or nanoscopic level. Complementary to ''bottom-up'' approaches, which construct supramolecular ensembles by the design and synthesis of functionalized small molecular units or large molecular motifs, nanofabrication explores whether individual units, such as small molecular ligands, or large molecules, such as proteins, can be positioned with nanometer precision. The separation and local environment can be engineered to control subsequent intermolecular interactions. Feature sizes as small as 2 ؋ 4 nm 2 (32 alkanethiol molecules) are produced. Proteins may be aligned along a 10-nm-wide line or within two-dimensional islands of desired geometry. These high-resolution engineering and imaging studies provide new and molecular-level insight into supramolecular chemistry and self-assembly processes in bioscience that are otherwise unobtainable, e.g., the influence of size, separation, orientation, and local environment of reaction sites. This nanofabrication methodology also offers a new strategy in construction of two-and three-dimensional supramolecular structures for cell, virus, and bacterial adhesion, as well as biomaterial and biodevice engineering. S upramolecular chemistry has become an area of intense research (1-4), partly inspired by biological ensembles in nature, such as collagen and enzymes or protein assemblies in general. In nature, the collective properties and biofunctionalities of these ensembles depend not only on the individual molecular units but also (perhaps even more importantly) on the organization at the molecular or nanoscopic level (1, 2, 4, 5). Such organization dependence can be attributed to polyvalent interactions in biological systems (6). ''Bottom-up'' approaches have been taken to mimic nature and have resulted in creative synthesis of small molecular units (7,8) and large molecular motifs (9). These molecular building blocks contain the desired charge, polarization, or chemical functionalities that will affect intermolecular interactions such as van der Waals forces, hydrogen bonding, polar attractions, and͞or hydrophobic interactions (7-9). These interactions dictate the subsequent assembly into supramolecular structures (4, 9-11). Complementary to these synthetic approaches, we explore whether individual units such as small molecular ligands or large molecules such as proteins can be positioned with nanometer precision by using nanoengineering methodologies. The separation and local environment can be engineered to influence subsequent intermolecular interactions.Micrometer-sized patterns of biomolecules can be produced by using relatively well known microfabrication technologies. Without using templates, DNA micropatterns may be directly produced by using photolithography (12)(13)(14). Micropatterns of proteins have also been ...

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“…Hexadecanethiol was shown to be an effective photoresist [9]. Dodecanethiol has been found to act as a lubricant and a passivation layer in Au-Au bonding studies [10,11] and as a corrosion barrier in Cu wire bonding studies [12].…”

Section: Technical Approachmentioning

confidence: 99%

Chemical strategies for die/wafer submicron alignment and bonding.

Martin¹,

Baca²,

Chu³

et al. 2010

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This late-start LDRD explores chemical strategies that will enable sub-micron alignment accuracy of dies and wafers by exploiting the interfacial energies of chemical ligands. We have micropatterned commensurate features, such as 2-d arrays of micron-sized gold lines on the die to be bonded. Each gold line is functionalized with alkanethiol ligands before the die are brought into contact. The ligand interfacial energy is minimized when the lines on the die are brought into registration, due to favorable interactions between the complementary ligand tails.After registration is achieved, standard bonding techniques are used to create precision permanent bonds. We have computed the alignment forces and torque between two surfaces patterned with arrays of lines or square pads to illustrate how best to maximize the tendency to align. We also discuss complex, aperiodic patterns such as rectilinear pad assemblies, concentric circles, and spirals that point the way towards extremely precise alignment. 4 ACKNOWLEDGMENTSWe thank the LDRD office and the Nanoscience to Microsystems Investment Area for providing the funding for this project. We would like to acknowledge

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Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry

Cited by 236 publications

References 0 publications

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Positioning protein molecules on surfaces: A nanoengineering approach to supramolecular chemistry

Chemical strategies for die/wafer submicron alignment and bonding.

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