Physical and optical properties of plasma polymerized thin films deposited by PECVD method

Cho, S.-H.; Park, Z.-T.; Kim, J.-G.; Boo, Jin‐Hyo

doi:10.1016/s0257-8972(03)00596-6

Cited by 28 publications

(11 citation statements)

References 10 publications

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“…Chevalier carbon contamination which became off-white in color after calcining [15]. Carbon co-deposition decreases the optical band gap and transmittance of the thin films as reported by Cho et al [27]. As in this case the deposited yttria doped films are transparent, it is evident that carbon contamination in the films is negligible.…”

Section: Resultssupporting

confidence: 53%

RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Chopade

Nayak

Bhattacharyya

et al. 2015

Applied Surface Science

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Section: Resultssupporting

confidence: 53%

RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Chopade

Nayak

Bhattacharyya

et al. 2015

Applied Surface Science

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“…The reason, as is generally recognized, is that plasma polymerization is too complex to control the molecular structure. Precursor molecules, which consist of source monomers and radicals decomposed from the monomers, are plentiful and easily change depending on the plasma condition [4–6]. Moreover, the ions accelerated by the electric field between the plasma and the grounded electrode bombard the surface of the film and influence polymerization [7–9].…”

Section: Introductionmentioning

confidence: 99%

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

Moriki

Yumoto

2012

IEEJ Transactions Elec Engng

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An important issue in the polymerization of a polymer film by plasma-enhanced chemical vapor deposition (PECVD) is how to control the polymer structure. As is generally recognized, it is extremely difficult to control the process because it is very complex. For example, various precursors in the plasma arise from fragmentation of source monomers, which can easily change by varying the plasma conditions. High-energy electrons and ions in the plasma bombard the surface of the deposited film and affect the chemical reaction on the film. Moreover, the droplets that arise from the reactor wall by sputtering will accumulate on the film. However, if we aim to fabricate only a photonically functional polymer film, we will be able to find a solution. In this paper, we propose copolymerization from two types of monomers; one type is used as jointing materials by cracking, and the other is used as a photonic functional segment without serious deformation. This difference of action arises from a difference in the formation enthalpy. To confirm this idea, as an initial step, we copolymerized a film from a mixture of benzene (C 6 H 6 ) as the functional segment and cyclohexene (C 6 H 10 ) as the jointing material under the low radio frequency power. The deposited film consists of sp 2 bonding clusters surrounded by sp 3 bonded (alkyl) networks. We confirmed that the sp 2 bonding clusters mostly belong to phenyl, with a few belonging to olefins arising from decomposed C 6 H 6 . In addition, the amount of sp 2 bonding increases proportionally with increasing ratio of C 6 H 6 in the mixture, and the ratio of phenyl in the film becomes comparable to that of polystyrene. From these facts, we speculate that C 6 H 10 acts as the jointing material and C 6 H 6 as the functional segment. Additionally, we introduced tetrafluorocarbon (CF 4 ) to the plasma. CF 4 decomposes with a smaller energy than C 6 H 10 , and it forms mainly fluorine and CF 3 radicals. The fluorine radical pulls out hydrogen from the film and reacts to form dangling bonds in the film. Moreover, we speculate that they will terminate the dangling bonds.

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“…Recently, considerable work has been undertaken to fabricate polymeric dielectric and photonic thin films using plasma enhanced chemical vapor deposition techniques (PECVD) [1][2][3][4][5][6][7][8] due to its room temperature, solvent-free and versatile operation. Many organic precursors can be selected to prepare thin polymer films with a wide range of compositions and chemical functionalities.…”

Section: Introductionmentioning

confidence: 99%

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

et al. 2007

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Physical and optical properties of plasma polymerized thin films deposited by PECVD method

Cited by 28 publications

References 10 publications

RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

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