Transition-metal dichalcogenides possess high carrier
mobility
and can be scaled to sub-nanometer dimensions, making them viable
alternative to Si electronics. WSe2 is capable of hole
and electron carrier transport, making it a key component in CMOS
logic circuits. However, since the p-type electrical performance of
the WSe2-field effect transistor (FET) is still limited,
various approaches are being investigated to circumvent this issue.
Here, we formed a heterostructural multilayer WSe2 channel
and solution-processed aluminum-doped zinc oxide (AZO) for compositional
modification of WSe2 to obtain a device with excellent
electrical properties. Supplying oxygen anions from AZO to the WSe2 channel eliminated subgap states through Se-deficiency healing,
resulting in improved transport capacity. Se vacancies are known to
cause mobility degradation due to scattering, which is mitigated through
ionic compensation. Consequently, the hole mobility can reach high
values, with a maximum of approximately 100 cm2/V s. Further,
the transport behavior of the oxygen-doped WSe2-FET is
systematically analyzed using density functional theory simulations
and photoexcited charge collection spectroscopy measurements.