Physical Parameter Extraction and Modeling of Metallized Deeply-Etched Vertical Mirrors

El-Massry, Moez; Nazeer, Sébastien; Sabry, Yasser M.; Khalil, Diaa

doi:10.1109/jmems.2021.3108833

Cited by 3 publications

(6 citation statements)

References 14 publications

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“…According to the investigation in ref. [19], the thickness of the vertical micromirrors' coating varies from the top of the substrate to the bottom of the etched mirror, and this effect is more significant when the etched depth is larger and deeper into the substrate. We aim to study this effect and its impact on the mirror's performance.…”

Section: Modelling the Effect Of Metal Thickness Gradientmentioning

confidence: 99%

“…Deeply etched vertical micromirrors are used in these structures and are thus required to exhibit highly reflective abilities [8], [9]. Upon fabrication using deep-reactive-ion-etching (DRIE) technology [10], [11], they are coated with metallic layers using the Magnetron Ion Sputtering process [12], [13]. In this article, we investigate the metallization effects of the fabrication process on vertical micromirrors.…”

Section: Introductionmentioning

confidence: 99%

“…We then import the fill factor data of the sputtering aluminum coating of different thicknesses from refs. [19], [20]. This data is used to create a fitting function to relate the fill factor variation to the thickness variation of the aluminum film.…”

Section: Introductionmentioning

confidence: 99%

“…This fill factor relation results in values of n and k that vary with the change in the deposited thickness. If this effect is dropped and the bulk properties of Al are used together with its skin depth information, at 3.6 µm wavelength the minimum theoretical thickness needed for about 98% reflectivity is about 56 nm [17], [19]. However, the actual reflectivity for this thickness can drop to about 65%.…”

Section: Introductionmentioning

confidence: 99%

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Modeling and analysis of nonuniform metal-coating of deeply-etched vertical micromirrors

Morshed,

Sabry,

Khalil

2024

MOEMS and Miniaturized Systems XXIII

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Highly reflective micromirrors have been in high demand in recent decades. This is due to their usage in many systems, such as optical scanners, lab-on-chip spectrometers, and microfabricated structures for gas sensing applications. In these applications, highly reflective micromirrors have been used extensively. Deeply etched vertical micromirrors that have high reflectivity are used in these structures. Upon fabrication using deep-reactive-ion-etching (DRIE) technology, they are coated with metallic layers using the Magnetron Ion Sputtering process. In this article, we investigate the effects of the metallization process of fabricated vertical micromirrors. We derive a model to study the effects of the non-idealities caused by the process, such as the structure's porosity and the metal layer thickness variation, on the reflective performance of the metalized surface. This is investigated using a Gaussian beam sourcewhich is analogous to a single-mode fiber input. The vertical micromirror investigated is composed of a silicon substrate of 1 mm thickness and an aluminum metal layer of thickness that varies from 74 to 82 nm in the vertical direction, which represents a reflection coefficient magnitude that varies from about 89% at minimum metal thickness to about 95% at maximum thickness. The reflected beam is studied in terms of power, skewness and kurtosis.

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Section: Modelling the Effect Of Metal Thickness Gradientmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Modeling and analysis of nonuniform metal-coating of deeply-etched vertical micromirrors

Morshed,

Sabry,

Khalil

2024

MOEMS and Miniaturized Systems XXIII

Self Cite

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“…The vertical etching of these structures allows for the utilization of the in-plane light propagation in a micro-optical bench manner, in which the different components can be monolithically integrated and self-aligned on a single chip 7 . However, being realized using the deep etching techniques, the response of these structures is challenged by different technological artifacts and losses, 8 – 10 as shown in Fig. 1(b) for the beam divergence effect leading to coupling loss with the output, 8 in Fig.…”

Section: Introductionmentioning

confidence: 99%

Modeling of surface roughness in deeply etched photonic MEMS mirrors and filters

et al. 2022

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We study the impact of the surface roughness on the response of deeply etched silicon Bragg mirrors and resonators. The transfer matrix method is extended to account for the roughness in multilayered systems. The model is first verified numerically using the finite difference time domain (FDTD) method for surface roughness values up to 80 nm at a wavelength of 1550 nm. The response of the mirrors and filters having an RMS roughness of 30 nm is calculated by the developed model and compared with the numerical results of the FDTD results, and it shows a good agreement. Then the model results are compared with the experimental data of a Bragg mirror and filter, fabricated by the deep reactive ion etching Bosch process of silicon on an insulator wafer; they show a very good agreement in the insertion loss and 3-dB bandwidth due to the roughness model. Finally, the transmission, 3-dB bandwidth and quality factor of the optical filters based on single, double, and triple silicon layer mirrors are examined using the model and accounting for Gaussian beam excitation. The presented model can be used to guide the requirements on the fabrication quality of optical surfaces and the choice of the optimum number of layers.

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Silicon Multipass Cells for Localized Multi-Parameter Gas Sensing by Absorption Spectroscopy

Fathy,

Magdy,

Sabry

et al. 2024

J. Lightwave Technol.

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Physical Parameter Extraction and Modeling of Metallized Deeply-Etched Vertical Mirrors

Cited by 3 publications

References 14 publications

Modeling and analysis of nonuniform metal-coating of deeply-etched vertical micromirrors

Modeling and analysis of nonuniform metal-coating of deeply-etched vertical micromirrors

Modeling of surface roughness in deeply etched photonic MEMS mirrors and filters

Silicon Multipass Cells for Localized Multi-Parameter Gas Sensing by Absorption Spectroscopy

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