2008
DOI: 10.1016/j.materresbull.2007.06.049
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Physical properties of (La,Sr)Ti(O,N)3 thin films grown by pulsed laser deposition

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Cited by 15 publications
(15 citation statements)
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“…From SEM investigations of the surface and the crosssection it was deduced that the films grown by PLD are very dense and show only a small surface roughness. The latter was quantitatively measured by AFM and found to vary between 5 and 15 nm and to decrease with increasing La/N content [51]. As one representative example Fig.…”
Section: Preparation Of Thin Filmsmentioning
confidence: 88%
See 1 more Smart Citation
“…From SEM investigations of the surface and the crosssection it was deduced that the films grown by PLD are very dense and show only a small surface roughness. The latter was quantitatively measured by AFM and found to vary between 5 and 15 nm and to decrease with increasing La/N content [51]. As one representative example Fig.…”
Section: Preparation Of Thin Filmsmentioning
confidence: 88%
“…The substrates were kept at 800 C during ablation. These oxide films were afterwards nitridated at 950 C for 3 h [51].…”
Section: Preparation Of Thin Filmsmentioning
confidence: 99%
“…Therefore PLD and its modifications are especially suitable for a one-step deposition of N-doped SrTiO 3 films as different sources of reactive nitrogen can be used in different modifications of PLD. An alternative way is a two-step preparation of N-substituted films, consisting of the deposition of oxide film and its subsequent thermal ammonolysis [5]. It has been shown that partial substitution of nitrogen for oxygen in SrTiO 3 (several at.%) reduces the dielectric leakage current [6] and also induces the formation of localised energy levels inside the SrTiO 3 band gap, thus providing Nitrogen-substituted cubic perovskite-type SrTiO 3 thin films were deposited in a one-step process using pulsed reactive crossed beam laser ablation (PRCLA) and RF-plasma assisted pulsed laser deposition (RF-PLD).…”
Section: Introductionmentioning
confidence: 99%
“…We reported on La-Ti-O-N films deposited by sputtering deposition [12,13]. (La 1 − x Sr x )-Ti-O-N films are reported as deposited by sol gel method [14] and laser ablation [15]. La-Ti-O-N thick layers were also obtained through ammonolysis of LaTiO 3.5 single-crystals [16].…”
Section: Introductionmentioning
confidence: 99%