Physical Self-Assembly And Nano-Patterning

Lu, T.‐M.; Ye, D.-X.; Karabacak, Tansel; Wang, G.-C.

doi:10.1557/proc-849-kk8.4

Cited by 7 publications

(9 citation statements)

References 16 publications

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“…3 and its inset, that the difference between mound radii in x-and y-axis increases as does the coverage or the deposition angle. This prediction agrees well with the experimental results of Dijken et al 7 and Lu et al 14 , where such side way growth of the mound with high aspect ratio has been observed with the deposition at grazing angle. In regards to Fig.…”

Section: B Mound Radiussupporting

confidence: 92%

“…9 (c)-(e)) which strikingly differs from what has been observed in the experiments. 7,14 This is understood by the fact that the flux blocked by the screening effect on the SH-side results in the increase of the flux on the IL-side (Fig. 10), which looks as if the blocked flux is simply displaced to the IL side.…”

Section: B the Steering Effects Vs The Screening Effectsmentioning

confidence: 98%

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Effects of deposition dynamics on epitaxial growth

Seo

Kim

2007

J. Phys.: Condens. Matter

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The dynamic effects, such as the steering and the screening effects during deposition, on an epitaxial growth (Cu/Cu(001)), is studied by kinetic Monte Carlo simulation that incorporates molecular dynamic simulation to rigorously take the interaction of the deposited atom with the substrate atoms into account. We find three characteristic features of the surface morphology developed by grazing angle deposition: (1) enhanced surface roughness, (2) asymmetric mound, and (3) asymmetric slopes of mound sides. Regarding their dependence on both deposition angle and substrate temperature, a reasonable agreement of the simulated results with the previous experimental ones is found. The characteristic growth features by grazing angle deposition are mainly caused by the inhomogeneous deposition flux due to the steering and screening effects, where the steering effects play the major role rather than the screening effects. Newly observed in the present simulation is that the side of mound in each direction is composed of various facets instead of all being in one selected mound angle even if the slope selection is attained, and that the slope selection does not necessarily mean the facet selection.

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Section: B Mound Radiussupporting

confidence: 92%

Section: B the Steering Effects Vs The Screening Effectsmentioning

confidence: 98%

Effects of deposition dynamics on epitaxial growth

Seo

Kim

2007

J. Phys.: Condens. Matter

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“…Thus, if we use a prepatterned substrate, as is often the case in the selective growth of the columns using low temperature glancing angle deposition, (14,15) we can achieve a patterned growth of nanowhiskers.…”

Section: Selective Growth Of Nanowhiskers By Shadowing Effectmentioning

confidence: 99%

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Suzuki

Kita

Hara

et al. 2010

J. Electrochem. Soc.

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In this study, we carry out high temperature glancing angle deposition (HT-GLAD) of Fe and Al on a heated substrate with trench patterns. When vapor is incident perpendicular to the trench direction, nanowhiskers grow only on the surface exposed to the vapor and not inside the trenches. When vapor is incident at a deposition angle larger than 80° on the sidewall of the trench and not on the substrate surface, nanowhiskers grow only on the sidewall because the condition of deposition at a high temperature and a large deposition angle is satisfied only for the sidewall. Thus, we succeed in the selective growth of nanowhiskers by controlling the geometrical deposition conditions. Further, we also discuss the effect of the local deposition geometry on the growth process.Geometrically selective growth by HT-GLAD is expected to be useful for growing nanowhiskers on nano-and microstructured substrates.

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“…Thus, if we use a prepatterned substrate, as is often the case in the selective growth of the columns using low-temperature GLAD (14,15), we can achieve patterned growth of nanowhiskers.…”

Section: Selective Growth Of Nanowhiskers By Shadowing Effectmentioning

confidence: 99%

Growth of Metal Nanowhiskers on Patterned Substrate by High-Temperature Glancing Angle Deposition

Suzuki¹,

Hara²,

Kita³

et al. 2009

ECS Trans.

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In this study, we carry out high-temperature glancing angle deposition (HT-GLAD) of Fe and Al on a heated substrate with trench patterns. When vapor is incident perpendicular to the trench direction, nanowhiskers grow only on the surface exposed to the vapor and not inside the trenches. On the other hand, when vapor is incident at a glancing angle on the sidewall of the trench and not on the substrate surface, nanowhiskers grow only on the sidewall, since the condition of deposition at high temperature and a glancing angle is satisfied only for the sidewall. Thus, we succeed the selective growth of nanowhiskers by controlling the geometrical deposition conditions. Further, we also discuss the effect of the local deposition geometry on the growth process. Geometrically selective growth by HT-GLAD is expected to be useful for growing nanowhiskers on nano- and microstructured substrates.

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Physical Self-Assembly And Nano-Patterning

Cited by 7 publications

References 16 publications

Effects of deposition dynamics on epitaxial growth

Effects of deposition dynamics on epitaxial growth

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Growth of Metal Nanowhiskers on Patterned Substrate by High-Temperature Glancing Angle Deposition

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