2007
DOI: 10.1016/j.surfcoat.2006.07.086
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Physico-chemical properties of plasma-polymerized tetravinylsilane

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2007
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Cited by 25 publications
(14 citation statements)
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“…This can be caused by higher energy of impact by particles during deposition. In addition, the higher average deposition rate calculated from the thickness of deposited film is also likely to create more disordered surface of films [25,26]. For the oxygen treated surface, its roughness is even higher due to the oxygen implantation (thickening) and etching (thinning) on the surface.…”
Section: Surface Morphology By Afmmentioning
confidence: 99%
“…This can be caused by higher energy of impact by particles during deposition. In addition, the higher average deposition rate calculated from the thickness of deposited film is also likely to create more disordered surface of films [25,26]. For the oxygen treated surface, its roughness is even higher due to the oxygen implantation (thickening) and etching (thinning) on the surface.…”
Section: Surface Morphology By Afmmentioning
confidence: 99%
“…In literature, the characterization of the physicochemical properties of thin organic plasma polymerized layers concentrates on films used as scratch protection finishing or on polymers which can replace brittle metallic or ceramic components in electronic circuits 3, 4. For instance Cech et al5, 6 measured the mechanical (elastic modulus and hardness) and optical properties of plasma polymerized silane layers (tetravinylsilane and vinyltriethoxysilane) in dependence on the effective power of the plasma.…”
Section: Introductionmentioning
confidence: 99%
“…An increase in hardness for an increase in RF power has been reported previously for plasma polymers. 39,41,42 This Figure 9 Adhesion data for polyLA deposited on PS at various RF power levels. THIN FILMS FROM L. ANGUSTIFOLIA ESSENTIAL OILtrend is typically attributed to an increase in crosslink density associated with increasing applied RF power and would account for the apparent change in hardness observed.…”
mentioning
confidence: 99%