2013
DOI: 10.1016/j.surfcoat.2013.06.081
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Piezoelectric domains in BiFeO3 films grown via MOCVD: Structure/property relationship

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Cited by 12 publications
(17 citation statements)
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“…These films possess a rhombohedral structure as confirmed through a noninvasive approach, recording a θ–2θ scan in the 50–54° range at χ angle equal to 26° . This result is in good agreement with previously reported literature data, which affirm a distortion from rhombohedral to tetragonal only for very thin films, i.e.…”
Section: Mocvd Growth Of Bifeo3 and Doped‐bifeo3 Filmssupporting
confidence: 91%
See 2 more Smart Citations
“…These films possess a rhombohedral structure as confirmed through a noninvasive approach, recording a θ–2θ scan in the 50–54° range at χ angle equal to 26° . This result is in good agreement with previously reported literature data, which affirm a distortion from rhombohedral to tetragonal only for very thin films, i.e.…”
Section: Mocvd Growth Of Bifeo3 and Doped‐bifeo3 Filmssupporting
confidence: 91%
“…Deposition temperature (T dep ) was shown to have a great effect on the BiFeO 3 functional properties . In fact, even if it has a slight effect on structure and morphology of films, it has a major impact on functional properties, with a T dep of 800 °C yielding the most promising films in terms of piezo‐ and ferro‐electric properties . This deposition temperature may be compared with the lower temperature applied in a recently reported MOCVD process using different Bi precursors .…”
Section: Mocvd Growth Of Bifeo3 and Doped‐bifeo3 Filmsmentioning
confidence: 99%
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“…The main deposition techniques that have been applied to the production of BiFeO 3 films are: chemical solution deposition [20,21], pulsed laser deposition (PLD) [22,23], sputtering [24], sol-gel [15,16], and metal organic chemical vapor deposition (MOCVD) [25][26][27][28]. So far, only sol-gel and sputtering have been applied to deposit BiFeO 3 film used in a piezoelectric harvester [28,29], due to their simplicity and low operating temperature, which enable the use of a wide variety of substrates.…”
Section: Introductionmentioning
confidence: 99%
“…The preparation and modification of BFO films have been extensively studied. At present, various techniques have been developed to fabricate BFO films, such as pulsed laser deposition [4], magnetron sputtering [5], molecular beam epitaxy [6], hydrothermal synthesis [7], electrophoretic deposition [8], and metal organic chemical vapor deposition [9]. Moreover, sol-gel method as an alternative route has been widely used to prepare BFO films [10,11] because of its low cost, easy to & Wei Cai caiwei_cqu@163.com adjust composition and integration with devices.…”
Section: Introductionmentioning
confidence: 99%