Piezoelectric
semiconductor III-nitride nanostructures have received
increasing interest as an alternative material for energy harvesters,
sensors, and self-sustainable electronics, demanding further clarification
of their piezoelectric behavior. Despite the feasibility of piezoresponse
force microscopy (PFM) to resolve piezoresponses at the nanoscale,
several difficulties arise when the measurements are performed on
low piezocoefficient materials due to various artifacts. This work
shows that semi-quantitative PFM on low piezocoefficient III-nitrides
can be achieved in high-aspect-ratio nanostructures, such as nanowires
or nanorods. For conventional bulk and thin films, accurate determination
of their piezoresponses is limited because of clamping and bending
effects which can occur simultaneously during PFM measurements. While
the clamping effect only reduces the piezoresponse amplitude, the
bending motion either increases or decreases this amplitude and can
also rotate the phase by 180°. Improved electric field distribution
in nanowires minimizes both artifacts, allowing correct determination
of crystal polarities and piezocoefficients. In contrast to the reports
in the literature, we do not observe giant piezoelectricity in III-N
nanowires with a diameter in the range of 30–80 nm. This work
provides an access to fundamental parameters for developing III-N-based
piezoelectric nanodevices.