Planar Magnetron Sputtering

Waits, Robert K.

doi:10.1016/b978-0-12-728250-3.50009-x

Cited by 47 publications

(33 citation statements)

References 52 publications

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“…This represents the meso-porosity of the layer. The ppg layer appears, instead, more compact, similarly to what reported in the literature3745464748. Accordingly, after thermal treatments, grain coalescence causes a shrinkage of the pores in the ppg layer (especially at the surface: see Fig.…”

Section: Resultssupporting

confidence: 85%

“…An optimum inclination angle of 12.7° was identified in our setup as a compromise between the shadowing effect by the starting TiO 2 seeds (this define the lower limit in θ) and the verticalization of the Ti flux by increasing θ, that has a tendency to progressively close the pores by proceeding the deposition. Hereafter we refer to our refined methodology at inclination angle of 12.7° as gig-lox; the reference process, related to the use of a standard parallel plate geometry in Thornton conditions45, will be indicated by ppg. See methods and SI for more details.…”

Section: Resultsmentioning

confidence: 99%

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Multi-Scale-Porosity TiO2 scaffolds grown by innovative sputtering methods for high throughput hybrid photovoltaics

Sanzaro

Smecca

Mannino

et al. 2016

Sci Rep

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We propose an up-scalable, reliable, contamination-free, rod-like TiO2 material grown by a new method based on sputtering deposition concepts which offers a multi-scale porosity, namely: an intra-rods nano-porosity (1–5 nm) arising from the Thornton’s conditions and an extra-rods meso-porosity (10–50 nm) originating from the spatial separation of the Titanium and Oxygen sources combined with a grazing Ti flux. The procedure is simple, since it does not require any template layer to trigger the nano-structuring, and versatile, since porosity and layer thickness can be easily tuned; it is empowered by the lack of contaminations/solvents and by the structural stability of the material (at least) up to 500 °C. Our material gains porosity, stability and infiltration capability superior if compared to conventionally sputtered TiO2 layers. Its competition level with chemically synthesized reference counterparts is doubly demonstrated: in Dye Sensitized Solar Cells, by the infiltration and chemisorption of N-719 dye (∼1 × 1020 molecules/cm3); and in Perovskite Solar Cells, by the capillary infiltration of solution processed CH3NH3PbI3 which allowed reaching efficiency of 11.7%. Based on the demonstrated attitude of the material to be functionalized, its surface activity could be differently tailored on other molecules or gas species or liquids to enlarge the range of application in different fields.

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Section: Resultssupporting

confidence: 85%

Section: Resultsmentioning

confidence: 99%

Multi-Scale-Porosity TiO2 scaffolds grown by innovative sputtering methods for high throughput hybrid photovoltaics

Sanzaro

Smecca

Mannino

et al. 2016

Sci Rep

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“…Target erosion is a feature of all planar magnetron based sputtering sources [30]. It can essentially influence the cluster size distribution [31,32].…”

Section: Influence Of Target Erosionmentioning

confidence: 99%

Mass Spectrometric Investigations of Nano‐Size Cluster Ions Produced by High Pressure Magnetron Sputtering

Ganeva

Peter

Bornholdt

et al. 2012

Contrib. Plasma Phys.

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A comparison of quadrupole mass spectrometric (QMS) and transmission electron microscopic (TEM) characterization of silver nano-cluster deposition produced by a nano-cluster source consisting of a planar DC magnetron sputter source in a high pressure gas aggregation chamber is presented and discussed. Cluster sizes and size distributions detected by the two different techniques are compared and the differences are discussed. The effects of He to Ar ratio, gas flow and magnetron power on the cluster size distribution are evaluated. The influence of the target erosion and aging effects are mentioned, too.

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“…Deposition rates were selected in the range 0.5 to 7 A sec-'. This corresponded to open circuit voltages of 800 to 1400V and deposition working voltages of 400 to 600 V with current values of [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] mA. Chromel-alumel thermocouple measurements indicated that the shadow mask temperature was <50"C for all deposition procedures.…”

Section: Methodsmentioning

confidence: 99%

Magnetron sputtered gold contacts on n‐GaAs

Buonaquisti¹,

Matson²,

Russell³

et al. 1984

Surface & Interface Analysis

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DC planar magnetron sputtering has been used to deposit gold Schottky barrier electrical contacts on n-type GaAs. The electrical character of the contact was determined from current-voltage (I-V) and electron-beam-induced voltage (EBIV) data. These data showed that the Schottky barrier height of magnetron sputter-deposited contacts was lower than for vapor deposited contacts. The barrier-height was a function of the deposition rate for electronically isolated substrates, and was dependent upon both the surface treatment prior to contact deposition, and upon doping density and post-deposition heat treatment. These effects are discussed in terms of particle irradiation of the surface during contact deposition.

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Planar Magnetron Sputtering

Cited by 47 publications

References 52 publications

Multi-Scale-Porosity TiO2 scaffolds grown by innovative sputtering methods for high throughput hybrid photovoltaics

Multi-Scale-Porosity TiO2 scaffolds grown by innovative sputtering methods for high throughput hybrid photovoltaics

Mass Spectrometric Investigations of Nano‐Size Cluster Ions Produced by High Pressure Magnetron Sputtering

Magnetron sputtered gold contacts on n‐GaAs

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