2015
DOI: 10.1515/amm-2015-0228
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Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

Abstract: Plasma Assisted Chemical Vapour Deposition (PA CVD) method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview of the possibilities of plasma processes for the deposition of diamond-like carbon coatings doped Si and/or N atoms on the Ti Grade2, aluminum-zinc alloy and polyetherketone substrate. Depending on the type of modifi… Show more

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Cited by 26 publications
(7 citation statements)
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“…The chemical or physical vapor deposition can produce uniform and dense coatings. Moreover, plasma treatment has been used in vapor deposition, which can deposit homogeneous, well-adhesive coatings at lower temperature on different substrates [20,21]. To improve the surface roughness, structure, and mechanical properties of CF, hydrogen and oxygen plasma treatments are applied.…”
Section: Introductionmentioning
confidence: 99%
“…The chemical or physical vapor deposition can produce uniform and dense coatings. Moreover, plasma treatment has been used in vapor deposition, which can deposit homogeneous, well-adhesive coatings at lower temperature on different substrates [20,21]. To improve the surface roughness, structure, and mechanical properties of CF, hydrogen and oxygen plasma treatments are applied.…”
Section: Introductionmentioning
confidence: 99%
“…Our team conducted a lot of researches on DLC layers deposited on substrates [56]. The results for the Ti Grade 2 (after plasma processes) obtained from the biological and corrosion tests suggest that titanium with the plasmochemically modified surface did not cause severe cytotoxicity against MG63 cells and improves corrosion properties.…”
Section: Titanium and Aluminum Alloysmentioning
confidence: 99%
“…However, it also has disadvantages, namely, hydrophobicity and low surface free energy, resulting in poor adhesive properties. In order to improve the properties of PEEK, we modified the samples with ion etching and deposited layers a-CN:H/ a-SiCN:H by using RFCVD [56].…”
Section: Polymersmentioning
confidence: 99%
“…One of the most promising and economically viable ways in which this objective can be achieved is the use of modern engineering methods on the surface properties of materials. One such method, and the most promising, is Plasma-Assisted Chemical Vapor Deposition (PA CVD) [ 29 , 30 , 31 ].…”
Section: Introductionmentioning
confidence: 99%