Plasma assisted techniques for deposition of superhard nanocomposite coatings

Abstract

Various techniques based on plasma application have been successfully used for deposition of superhard nanocomposite coatings. These techniques possess many varying parameters, which in turn influence the properties of a growing coating. Therefore it is important to reveal common regularities, if any, between the process parameters and properties of the coatings. The paper addresses this issue based on the results acquired by the application of plasma assisted CVD and PVD methods. Here it is shown how different deposition parameters, such as working gas pressure, bias and temperature, affect coating properties, mainly hardness. These parameters are found to have a complex influence and the effect caused by variation of one deposition parameter can be similar to that of another one.This presents an opportunity to improve other properties of the coating while maintaining the hardness.

Plasma enhanced magnetron sputter deposition of Ti–Si–C–N based nanocomposite coatings

“…Recent reviews on various deposition technologies can be found in refs. [59,60]. Compared with PECVD, PVD has many advantages such as the low deposition temperature, which allows the processing of low temperature substrate materials.…”

Fabrication of electric heating garment with plasma-assisted metal coating (PAC) technology

“…A more effective alternative method to manufacture heat-generating clothing is to use plasma-assisted metal coating (PAC) (Schneider et al , 2000; Shea, 2005; Martinu et al , 2010; Lilioara et al , 2019). Through this technology, the metal can be directly and equally plated on the cloth surface, the minimum thickness can be controlled in nano-scale, and the treated cloth can maintain its softness without damaging the original physical properties such as tensile strength and texture (Levchuk, 2007; Wang et al , 2017).…”

Effects of capacitively-coupled radio-frequency discharge on operation voltage in magnetron sputtering

“…However, the sputtered particles are mainly composed of neutrals and so it is difficult to optimize the particle trajectories for better surface properties. Ionized physical vapor deposition (IPVD) has attracted more interest recently since it may produce better adhesion between the film and substrate in addition to providing better flexible process control [1][2][3][4][5][6][7]. It is also possible to treat irregularly-shaped components due to the high plasma density.…”