1996
DOI: 10.1016/s0040-6090(95)08526-2
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Plasma-deposited CdS layers from (o-phen) bis (diethyldithiocarbamate) cadmium

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Cited by 5 publications
(2 citation statements)
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“…Until this point in time, different strategies have been created to magnify nanoparticles of IV–VI semiconducting materials. To prepare IV–VI semiconductors, atomic layer epitaxy (ALE) [ 21 ], chemical bath deposition (CBD) [ 22 ], chemical vapor deposition (CVD) [ 23 ], and consecutive ionic layer adsorption and reaction (SILAR) [ 24 ] have been traditionally used. SILAR depends on the dip of the substrate into independently positioned cations and anions followed by washing after every response, it makes possible to give a heterogeneous response among the solid stage and the solvated ions in the solution.…”
Section: Introductionmentioning
confidence: 99%
“…Until this point in time, different strategies have been created to magnify nanoparticles of IV–VI semiconducting materials. To prepare IV–VI semiconductors, atomic layer epitaxy (ALE) [ 21 ], chemical bath deposition (CBD) [ 22 ], chemical vapor deposition (CVD) [ 23 ], and consecutive ionic layer adsorption and reaction (SILAR) [ 24 ] have been traditionally used. SILAR depends on the dip of the substrate into independently positioned cations and anions followed by washing after every response, it makes possible to give a heterogeneous response among the solid stage and the solvated ions in the solution.…”
Section: Introductionmentioning
confidence: 99%
“…Species such as thiolates, dithiocarbamates (dtc) [7][8][9][10][11], dithiophosphinates [12], xanthates [13][14][15], and other compounds [16] have been successfully used to obtain respective sulfides. So far, dithiocarbamates remain most widely used for this purpose with dtc being undoubtedly the one of the most explored S,S 0 -chelate systems.…”
Section: Introductionmentioning
confidence: 99%