1998
DOI: 10.1016/s0257-8972(97)00298-3
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Plasma diagnostics for surface modification of polymers

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Cited by 45 publications
(36 citation statements)
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“…This effect is responsible for the decrease in the contact angle that occurs at much lower microwave power/ treatment time than the argon treated polystyrene surface. Meichsner et al observed bands at (3500cm -1 to 3000cm -1 ) and various C-O bands (1300cm -1 -1000cm -1 ), which are similar to our observations [16]. In figure 4 (polyethylene treated with oxygen), the band around 3500cm -1 is due to the (-OH) group and the broadening could be due to its intermolecular or intramolecular reactions.…”
Section: Ftir-atr Analysissupporting
confidence: 91%
“…This effect is responsible for the decrease in the contact angle that occurs at much lower microwave power/ treatment time than the argon treated polystyrene surface. Meichsner et al observed bands at (3500cm -1 to 3000cm -1 ) and various C-O bands (1300cm -1 -1000cm -1 ), which are similar to our observations [16]. In figure 4 (polyethylene treated with oxygen), the band around 3500cm -1 is due to the (-OH) group and the broadening could be due to its intermolecular or intramolecular reactions.…”
Section: Ftir-atr Analysissupporting
confidence: 91%
“…This has been our motivation of conducting a combined experimental, numerical and analytical investigation of CCRF discharges in pure oxygen. Oxygen discharges, being one of the simplest electronegative plasma system, provide an interesting scenario for theoretical modeling (see for example [41][42][43][44][45][46][47][48][49][50]52] and references therein) and experimental diagnostics [49,50,[52][53][54][55][56][57] of electronegative plasmas. In contrast to the previous work of the EAE in oxygen discharges with only numerical simulation [36], our complementary approach here certainly promises a more comprehensive description of the discharge properties.…”
Section: Introductionmentioning
confidence: 99%
“…Most notably O 2 , either as the main feedstock gas or as an admixture to halogen-or silicon-based gases, is of vital importance for a large variety of etching and thin-film deposition techniques [1,2,3,4,5,6,7]. The requirements on the controllability and predictability of these processes are so high that further advancement of this technology will depend on modeling tools which go beyond the macroscopic, fluid-type approximations, which, for instance, cannot reliably predict the velocity distributions of the species.…”
Section: Introductionmentioning
confidence: 99%