2023
DOI: 10.1038/s41598-023-37336-1
|View full text |Cite
|
Sign up to set email alerts
|

Plasma-discharge-integrated slot structure for microwave power limiter

Abstract: A slot structure was combined with a discharge electrode to limit incident high-power microwaves via the integration of plasma discharge. At the target resonating frequency of 9.45 GHz, the surface current was concentrated at an electrode, and the electric field was enhanced by the proposed design to lower the response power level of the incident signal. When a low-power signal is injected, plasma is not generated, and the incident wave travels without insertion loss. Double-stage slot structures were utilized… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 44 publications
0
0
0
Order By: Relevance
“…In addition, the diode limiter has a frequency-shift function that helps protect the LNA by moving the EMP out of the frequency range of the LNA or bypassing unwanted signals to the ground. Recently, a plasma-discharge slot structure has been adopted to limit the EMP and reduce the energy transmitted to the LNA [22]. It has the advantage of a high power capacity of more than 10 kW, whereas the diode limiter has a power capacity of only 10 W [19].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the diode limiter has a frequency-shift function that helps protect the LNA by moving the EMP out of the frequency range of the LNA or bypassing unwanted signals to the ground. Recently, a plasma-discharge slot structure has been adopted to limit the EMP and reduce the energy transmitted to the LNA [22]. It has the advantage of a high power capacity of more than 10 kW, whereas the diode limiter has a power capacity of only 10 W [19].…”
Section: Introductionmentioning
confidence: 99%