2003
DOI: 10.1016/s0009-2614(02)01715-3
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Plasma enhanced chemical vapor deposition of low dielectric constant SiCFO thin films

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Cited by 7 publications
(4 citation statements)
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“…The vibration bands at 1,040/cm were reported for the stretching of the SO 3 group and 1,377/cm for the O=S=O stretching in the SO 3 H group [18,32]. Although the peak from 1,100 to 1,200/cm is assigned to the C-F bond, it is overlapped by the peak of the Si-O bond [33,34]. The bands between 1,020 and 1,220/cm were reported as the peaks associated to the CF, CF 2 , and CF 3 bonds [35].…”
Section: Resultsmentioning
confidence: 99%
“…The vibration bands at 1,040/cm were reported for the stretching of the SO 3 group and 1,377/cm for the O=S=O stretching in the SO 3 H group [18,32]. Although the peak from 1,100 to 1,200/cm is assigned to the C-F bond, it is overlapped by the peak of the Si-O bond [33,34]. The bands between 1,020 and 1,220/cm were reported as the peaks associated to the CF, CF 2 , and CF 3 bonds [35].…”
Section: Resultsmentioning
confidence: 99%
“…The peaks at 1425 cm -1 in the spectra of AS and PFS nanoparticles have been attributed to undissociated SO 3 H groups [48,50]. The peaks at 1080, 1150, and 1190 cm -1 in the spectrum of PFS nanoparticles have been assigned to the C-F bond [52][53][54]. The results from FTIR analysis showed that all of the nanoparticles had the functional groups expected.…”
Section: Characterization Of Acid-functionalized Nanoparticlesmentioning
confidence: 91%
“…For a:C-F, even though k-values as low as 1. 3 have been achieved in the as-deposited state, 9 once the films are annealed, F outgassing not only leads to high shrinkage rates and but also poses difficulties in maintaining a sufficiently low k-value 10 (Table I). In the case of fluorinated DLC with k-values less than 2.5, reactions with SiO 2 , SiN, and TaN at 400 C result in film instability, even after instituting stabilization treatments, due to the formation of Si-F and Ta-F bonds.…”
Section: A Integration Challenges and Desired Properties Of Ultralowmentioning
confidence: 99%