1997
DOI: 10.1016/s0924-4247(97)80221-x
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Plasma-etched neural probes

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Cited by 100 publications
(56 citation statements)
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“…The pioneering work by Wise et al [18] has been followed by numerous studies that exploited integrated-circuit technology to build neurological microelectrodes. These devices typically consist of metallic electrodes, such as iridium [17], gold [19,20], and platinum [21], which are photolithographically patterned on passivated silicon substrates (Figure 1.3-6). The interconnects are passivated by a dielectric layer.…”
Section: Mems Neural Probesmentioning
confidence: 99%
“…The pioneering work by Wise et al [18] has been followed by numerous studies that exploited integrated-circuit technology to build neurological microelectrodes. These devices typically consist of metallic electrodes, such as iridium [17], gold [19,20], and platinum [21], which are photolithographically patterned on passivated silicon substrates (Figure 1.3-6). The interconnects are passivated by a dielectric layer.…”
Section: Mems Neural Probesmentioning
confidence: 99%
“…For example, neuroprosthetic applications will have di!erent requirements than detailed connectivity experiments. Our current series of implants, with the relatively simple microwire electrode array provide a reference mark by which the recording performance of other types of implantable electrode systems can be evaluated [4,5,7].…”
Section: Discussionmentioning
confidence: 99%
“…A new silicon-on-insulator (SOI)-based MEAs was developed in Caltech and Stanford using a plasma and wet etching process to define the probe outline and make sharp tips [99]. The method was improved using only deep reactive ion etching (DRIE) process on SOI substrate with SiO2 layer acting as an etch stop.…”
Section: Silicon On Insulator (Soi) Probesmentioning
confidence: 99%