Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage

Bjørnsen, Geir; Roots, Jaan

doi:10.1116/1.3521489

Cited by 6 publications

(6 citation statements)

References 13 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Our etched method ( Fig. 1d) removes PDMS residue remaining on the 3D template's features through the use of a reactive ion etcher (RIE, Plasma-Therm) at a power of 300 W for 40 minutes with gas flow rates of 10 standard cubic centimeters (sccm) per minute for O 2 and 40 sccm for SF 6 [39]. A bench-top plasma system could be substituted for the RIE.…”

Section: B Fabricating the Pdms Stencilmentioning

confidence: 99%

Polydimethylsiloxane Microstencils Molded on 3-D-Printed Templates

Guvanasen

Mancini

Calhoun

et al. 2014

J. Microelectromech. Syst.

View full text Add to dashboard Cite

Microstencils have been utilized in biomedical engineering to pattern cell cultures, engineer tissues, and pattern conductive materials in microelectronics for the measurement of bioelectric activity. However, fabricating these microstencils can be considerably time consuming, expensive, and cleanroom processing or laser micromachining intensive. We present microfabrication strategies for producing stencils rapidly and cost effectively, with minimal use of cleanroom facilities, ideal for prototyping or applications where microfabrication costs need to be conserved. The process utilizes 3-D-printed templates as master structures from, which polydimethylsiloxane (PDMS) microstencils are molded. The entire process, from concept to completed stencil, requires approximately one day; however, the majority of this time is budgeted for PDMS curing cycles, so it requires only ∼1-2 person hours to complete. These microstencils were used to pattern metal traces ∼160-1000-µm wide, on three commonly used BioMEMS substrate materialsto pattern rat cortical neuronal cell cultures with radii between ∼300 and 1000 µm-and to pattern organic materials. With the advancement of 3-D-printing technologies, we anticipate that our presented processes will improve in resolution and gain a greater cost advantage over traditional microstencilling methods.[2014-0019]

show abstract

Section: B Fabricating the Pdms Stencilmentioning

confidence: 99%

Polydimethylsiloxane Microstencils Molded on 3-D-Printed Templates

Guvanasen

Mancini

Calhoun

et al. 2014

J. Microelectromech. Syst.

View full text Add to dashboard Cite

show abstract

“…Recent reports have shown both dry and wetting etching methods for patterning PDMS. [25][26][27][28] However, most of the attempts were still suboptimal, with limitations such as low etch rate, poor etching selectivity, and surface defects. For example, approaches using wet etching to create desired PDMS patterns still suffer from a limited resolution and poor selectivity.…”

Section: Introductionmentioning

confidence: 99%

Surface micromachining of polydimethylsiloxane for microfluidics applications

et al. 2016

View full text Add to dashboard Cite

Polydimethylsiloxane (PDMS) elastomer has emerged as one of the most frequently applied materials in microfluidics. However, precise and large-scale surface micromachining of PDMS remains challenging, limiting applications of PDMS for microfluidic structures with high-resolution features. Herein, surface patterning of PDMS was achieved using a simple yet effective method combining direct photolithography followed by reactive-ion etching (RIE). This method incorporated a unique step of using oxygen plasma to activate PDMS surfaces to a hydrophilic state, thereby enabling improved adhesion of photoresist on top of PDMS surfaces for subsequent photolithography. RIE was applied to transfer patterns from photoresist to underlying PDMS thin films. Systematic experiments were conducted in the present work to characterize PDMS etch rate and etch selectivity of PDMS to photoresist as a function of various RIE parameters, including pressure, RF power, and gas flow rate and composition. We further compared two common RIE systems with and without bias power and employed inductively coupled plasma and capacitively coupled plasma sources, respectively, in terms of their PDMS etching performances. The RIE-based PDMS surface micromachining technique is compatible with conventional Si-based surface and bulk micromachining techniques, thus opening promising opportunities for generating hybrid microfluidic devices with novel functionalities.

show abstract

“…In the majority of applications of PDMS, the plasma processing is applied in order to improve the polymer surface adhesion in glass‐encapsulation of chips, widely used in the medical diagnostics . However, there is also a wide application spectra in the microflow devices where microchannels come into being, for example, through the etching of PDMS in SF 6 plasma …”

Section: Introductionmentioning

confidence: 99%

Effect of plasma treatment on the surface properties of polydimethylsiloxane

Kaczorowski

Szymański

Batory

et al. 2014

J of Applied Polymer Sci

View full text Add to dashboard Cite

In this work, the analysis of the plasma modification of polydimethylsiloxane (PDMS) substrates was conducted. The influence of the modification onto the changes occurred within the geometrical structure and chemical composition of the surface was analyzed. Due to the study of the atomic force microscopy, it was possible to determine the relationships between the surface development and applied process parameters, defining the conditions facilitating to obtain isotropic or anisotropic orientations of wrinkles. A precise analysis of the chemical composition of the surface, executed before and after the modification processes, enabled to define the changes in their elementary composition. Moreover, the modification influence onto the changes of the contact angle and the surface free energy were also analyzed. So, based on the research it was stated that the increase of value of the surface free energy is proportional to the sp 3 phase contents in the DLC coatings.

show abstract

Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage

Cited by 6 publications

References 13 publications

Polydimethylsiloxane Microstencils Molded on 3-D-Printed Templates

Polydimethylsiloxane Microstencils Molded on 3-D-Printed Templates

Surface micromachining of polydimethylsiloxane for microfluidics applications

Effect of plasma treatment on the surface properties of polydimethylsiloxane

Contact Info

Product

Resources

About