Plasma Deposition, Treatment, and Etching of Polymers 1990
DOI: 10.1016/b978-0-12-200430-8.50010-5
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Plasma Polymer-Metal Composite Films

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Cited by 19 publications
(8 citation statements)
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“…This is further supported by the lack of CH absorptions registered in FT‐IR spectra, later on discussed. As it can be also observed in Figure , the increment of the C 3 F 6 flow rate reflects in a more fluorinated matrix according to the expected higher concentration of fluorocarbon radicals …”
Section: Resultssupporting
confidence: 56%
See 1 more Smart Citation
“…This is further supported by the lack of CH absorptions registered in FT‐IR spectra, later on discussed. As it can be also observed in Figure , the increment of the C 3 F 6 flow rate reflects in a more fluorinated matrix according to the expected higher concentration of fluorocarbon radicals …”
Section: Resultssupporting
confidence: 56%
“…In particular, plasma technology can be exploited for the deposition of metal–polymer nanocomposite catalytic layer. Kay and Dilks developed a simultaneous metal sputtering and plasma polymerization process which enables the embedding of sputtered metals or metal alloys in different plasma polymer matrix …”
Section: Introductionmentioning
confidence: 99%
“…Plasma polymer films prepared by radio frequency (RF) sputtering of polymeric targets are nowadays well‐established materials whose origins date back to the 1970s 1. Composite films comprising a metal and a plasma polymer have likewise been investigated for several decades 2–4. Later the interest moved on to more complex composites such as the SiO x /fluorocarbon plasma polymer with the idea to apply them as protective coatings 5, 6.…”
Section: Introductionmentioning
confidence: 99%
“…Composite metal/plasma polymer thin films have been extensively studied since the early 1980s 1. The benefits of composites arise from combining materials with very different properties to produce structural or functional properties not present in any individual component.…”
Section: Introductionmentioning
confidence: 99%