The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy-deficient and monomer-deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius-type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si-O-Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input. monomer-deficient domain porous cage structures of Si-O-Si bonding network structures of Si-O-Si bonding e n e rg y -d e fi c ie n t d o m a in GR/FM W/FM K E Y W O R D S deposition characterization, infrared spectroscopy, organosilicon precursors, plasma polymerization, plasma-enhanced chemical vapor deposition Plasma Process Polym. 2019;16:e1900024 www.plasma-polymers.com