Plasma polymerization of tetrafluoroethylene

Nakajima, Kouji; Bell, Alexis T.; Shen, M.; Millard, Merle M.

doi:10.1002/app.1979.070230908

Cited by 73 publications

(29 citation statements)

References 16 publications

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“…Most of the applications are directed to fluorocarbon polymers because of the large chemical shifts in the binding energies of C(ls) electrons caused by fluorines bonded to carbon. As a result CF-, CF 2 , CF and tetrafunctional carbons can be distinguished (60,61,62,63,64). Knowing the relative electron line positions of the various groups, the C(ls) spectra can be deconvoluted and the group concentrations determined.…”

Section: Shen and Bellmentioning

confidence: 98%

A Review of Recent Advances in Plasma Polymerization

Shen

Bell

1979

ACS Symposium Series

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Section: Shen and Bellmentioning

confidence: 98%

A Review of Recent Advances in Plasma Polymerization

Shen

Bell

1979

ACS Symposium Series

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“…At still higher values, decomposition of the polymer becomes important, yielding fluorine-poor polymerization products. Nakajima et al 17 used a similar framework to explain the behavior of the deposition rate in a TFE system. Polymeric products can also be formed on a substrate placed outside the plasma zone.…”

Section: Introductionmentioning

confidence: 98%

Plasma polymerization of tetrafluoroethylene in a field‐free zone

Buzzard

Soong

Bell

1982

J of Applied Polymer Sci

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SynopsisPlasma polymerization of tetrafluoroethylene by itself and mixed with inert gases has been studied in the field free zone inside a Faraday cage. The chemical structure was analyzed by ESCA, revealing both linear and branched products. Linear products are formed by less energetic plasmas and at low monomer residence times. Lower energy plasmas result from the use of lower powers and lower percentages of helium in the feed. Production of linear products under these conditions is probably due to lower rates of free radical and metastable formation in the plasma. Through a combination of kinetic and mass transfer effects, shorter monomer residence times under high flow rates and within short distances from the front edge of the electrode give rise to a lower concentration of free radicals a t the electrode surface, producing a more linear polymer. Linear products were also formed at very high powers. This latter result is quite unexpected and is probably due to rapid gas phase polymerization. The chemical structure was not affected significantly by the substrate temperature or by hydrodynamics in this work. All of the evidence indicates that the gases were well mixed in the reaction zone for the range of process variables and for the gases studied. The deposition rate was also studied as a function of the reaction conditions. It was affected by the concentration of free radicals, the concentration of the monomer, and the substrate temperature. The observed deposition rate profile across the electrode is consistent with mass transfer and kinetic considerations governing free radical and monomer concentrations on the electrode surface. The deposition rate is greater a t the lower substrate temperature used, probably due to enhanced adsorption process.

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“…Some part of halogens in monomer were decomposed into ionic substances. Studies on the plasma polymerization of fluorocarbon were reported [4], [5], [6]. The work was performed for potential applications in the field of the coating industry as a surface protective coating and functional films.…”

Section: Characterization Of the Deposition Filmmentioning

confidence: 99%

Preparation of plasma polymerized films from chlorofluorocarbon.

Miyashita

Sugo

Kojima

1995

J. Photopol. Sci. Technol.

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A Chlorofluorocarbon was converted to a solid state substance for the purpose of nontoxic treatment and resource of specific freon waste. Experiments were performed by means of plasma polymerization from CFC 113 ( Trichlorotrifluoroethane ) and n-hexane mixtures. The maximum weight deposition rate of the film from CFC 113 and n-hexane is 1. S X 103 mg cm 2 s' at a two-one weight mixing ratio of CFC 113 and hexane in the flask tank. This deposition rate is about 10 times as large as that from n-hexane itself The 16% weight amount of gas mixture introduced into the reaction chamber was converted to polymeric film on the lower electrode at the preparation condition. Solidification recovery in the whole chamber was more than 50 %. Results of XPS and IR measurements indicate the existence of C-F and C-Cl covalent bonds in the films. UV-VIS spectra of the films were significantly different from that of n-hexane itself.

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Plasma polymerization of tetrafluoroethylene

Cited by 73 publications

References 16 publications

A Review of Recent Advances in Plasma Polymerization

A Review of Recent Advances in Plasma Polymerization

Plasma polymerization of tetrafluoroethylene in a field‐free zone

Preparation of plasma polymerized films from chlorofluorocarbon.

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