Plasma Polymerization of Thin Films:  Correlations between Plasma Chemistry and Thin Film Character

Guerin, D.; Hinshelwood, D.D.; Monolache, Sorin; Dénès, F.; Shamamian, V. A.

doi:10.1021/la011566j

Cited by 23 publications

(21 citation statements)

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The other radical species detected in the 5 mTorr plasma were absent in the 50 and 100 mTorr plasmas. 20 The only additional species detected at the higher pressures was carbon monoxide, which is seen at 28 Dalton.…”

Section: Other Species At 50 and 100 Mtorrmentioning

confidence: 97%

“…20 The vacuum system is composed of a commercially available double-walled, 8 in. 20 The vacuum system is composed of a commercially available double-walled, 8 in.…”

Section: A Plasma Chamber and Gas Handlingmentioning

confidence: 99%

“…20 This was because oxidation of the films resulted in carbonoxygen double bonds. No atomic oxygen was detected in the plasmas and it is not considered a significant source of film oxidation.…”

Section: Ch 3 Ch ¿ Oh Ions and Thin-film Chemistrymentioning

confidence: 99%

“…20 The 61 Dalton ion is generated by proton attachment to the precursor: 20 The 61 Dalton ion is generated by proton attachment to the precursor:…”

Section: And 61 Dalton Speciesmentioning

confidence: 99%

“…20 Assuming a Maxwellian electron energy distribution, at this T e , about 4% of the electrons will have energy greater than the 20 eV needed to create the methyl ion from the precursor. However, the neutral methyl radicals were only clearly detected at 5 mTorr.…”

Section: F Methyl Radical At 50 Mtorrmentioning

confidence: 99%

See 4 more Smart Citations

Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films

Guerin

Fernsler

Shamamian

2003

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

Self Cite

View full text Add to dashboard Cite

Articles you may be interested inRole of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition J.Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomersThe neutral gas-phase chemistry of an isopropyl alcohol/argon pulsed plasma was investigated. Appearance potential mass spectrometry was used to identify the neutral species present in the plasma. This article complements the previously published study of the positive ion flux to the deposition surface. Of particular interest was the identification of the reactive species in the plasma that exist as neutrals as well as ions. We determined that neutral radicals were produced by hydrogen-exchange mechanisms as well as electron-impact dissociation reactions. The electron-impact dissociation ionization of the precursor in the plasma resulted in reactive ions that did not occur as neutral species. A byproduct of this reaction was a large concentration of the neutral methyl radical. At low pressures, the methyl radicals diffuse to the surface and are incorporated into the deposited films. At elevated pressures, the neutral methyl radicals abstract hydrogen from gas-phase isopropyl alcohol molecules to form methane. Furthermore, as the pressure increases, the plasma becomes more remote from the deposition surface. Molecular ions created in the remote discharge preserve their chemical identity while diffusing to the surface, since the energies of charge-exchange limit the extent of reaction with the precursor.

show abstract

Section: Other Species At 50 and 100 Mtorrmentioning

confidence: 97%

“…20 The vacuum system is composed of a commercially available double-walled, 8 in. 20 The vacuum system is composed of a commercially available double-walled, 8 in.…”

Section: A Plasma Chamber and Gas Handlingmentioning

confidence: 99%

Section: Ch 3 Ch ¿ Oh Ions and Thin-film Chemistrymentioning

confidence: 99%

“…20 The 61 Dalton ion is generated by proton attachment to the precursor: 20 The 61 Dalton ion is generated by proton attachment to the precursor:…”

Section: And 61 Dalton Speciesmentioning

confidence: 99%

Section: F Methyl Radical At 50 Mtorrmentioning

confidence: 99%

See 3 more Smart Citations

Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films

Guerin

Fernsler

Shamamian

2003

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

Self Cite

View full text Add to dashboard Cite

show abstract

Use of different size grids to control the surface chemistry of plasma‐polymerized acrylic acid films in a hybrid discharge

Dhayal

2007

J of Applied Polymer Sci

View full text Add to dashboard Cite

The surface chemistry of plasma-polymerized acrylic acid (ppAc) films were controlled in a twostage (primary and processing) hybrid radio frequency (RF) discharge by changing the grid wire spacing (d s ). Two regions were defined in terms of d s with respect to Debye length (l d ) in the primary chamber at the grid to control the electron temperature (T e ) and surface chemistry of the ppAc films deposited in the processing chamber. A higher T e (>3 eV) in the processing plasma was possible for d s > l d , whereas decreasing d s relative to l d reduced T e . X-ray photoelectron spectroscopy was used to characterize the ppAc films deposited on a glass substrate. The ppAc films

show abstract

A Review of Plasma‐Surface Interactions During Processing of Polymeric Materials Measured Using the IRIS Technique

Fisher

2004

Plasma Processes & Polymers

View full text Add to dashboard Cite

Summary: This work reviews the use of the imaging of radicals interacting with surfaces (IRIS) technique to elucidate chemical mechanisms during plasma modification of polymers. Four systems are examined, NH and NH2 in NH3 plasmas, OH radicals in H2O and O2/NH3 plasmas, OH in SiO2 film deposition systems, and CF2 molecules in a variety of fluorocarbon plasmas. Some of the findings include that NH and NH2 are produced at the surface during NH3 plasma modification of polymers. Their surface interactions are directly connected to each other and are also influenced by other plasma species such as ions. In implantation systems, OH reacts at the surface of polymers, contributing to the creation of hydrophilic polymeric membrane surfaces. In addition, OH surface reactivity is largely controlled by the chemistry of OH and not by other species in the plasma for all three systems studied. In fluoropolymer‐deposition systems, CF2 is scattered from the surface and is strongly influenced by ion bombardment. Most notably, CF2 scatter coefficients can be correlated directly to the percentage of cross‐linking in amorphous fluorocarbon films deposited in a range of plasma systems. Comparisons and contrasts between plasma systems and surface interactions of different species are provided.

show abstract

Plasma Polymerization of Thin Films: Correlations between Plasma Chemistry and Thin Film Character

Cited by 23 publications

References 27 publications

Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films

Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films

Use of different size grids to control the surface chemistry of plasma‐polymerized acrylic acid films in a hybrid discharge

A Review of Plasma‐Surface Interactions During Processing of Polymeric Materials Measured Using the IRIS Technique

Contact Info

Product

Resources

About