2009
DOI: 10.1002/ppap.200930308
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Plasma Processes Combined with Colloidal Lithography to Produce Nanostructured Surfaces for Cell‐Adhesion

Abstract: The objective of the present work is to develop nanostructured surfaces by combining low pressure plasma process and colloidal lithography, with the aim of obtaining suitable substrates with predetermined ordered nanometric surface roughness and surface chemical composition. The chemical properties of the resulting nanostructures were characterized by means of X‐ray photoelectron spectroscopy (XPS) and water contact angle (WCA) measurements, their morphology was characterized by scanning electron microscopy (S… Show more

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Cited by 17 publications
(14 citation statements)
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“…Up to date, it is well known that the nanotube alignment in PECVD is due to the strong electric field near a substrate . However, it is unclear why the densely packed vertically aligned SWCNTs may be so long in a plasma, and what is required to make these nanostructures even longer.…”
Section: Introductionmentioning
confidence: 99%
“…Up to date, it is well known that the nanotube alignment in PECVD is due to the strong electric field near a substrate . However, it is unclear why the densely packed vertically aligned SWCNTs may be so long in a plasma, and what is required to make these nanostructures even longer.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the surface of deposited film was charged during the plasma discharge and this charging affected the formation of the peaks on the surface. The effects of plasma on the nanotopography of surfaces have been recently noticed and investigated more and more …”
Section: Resultsmentioning
confidence: 99%
“…The resulting surface consists of pAA truncated cones separated by Si substrate zones (seeFigure 14). A similar approach was used by Sardella et al[75] and Pistillo et al[76] for fabrication of PEO-like and pAA nanostructured surfaces for cell adhesion studies.…”
mentioning
confidence: 93%