1990
DOI: 10.1007/bf02672581
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Plasma source nitrogen ion implantation of Ti-6Al-4V

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Cited by 34 publications
(8 citation statements)
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“…In fact, this has been the subject of several investigations in clinical dentistry 4 . Among the surface treatment techniques, the most reported are: plasma assisted chemical vapor deposition 5 , conventional ion implantation [15][16][17][18][19] , plasma source nitrogen ion implantation 20 , conventional nitriding 21 , conventional plasma nitriding 22,23 , intensified plasma ion nitriding 24 , physical and chemical vapor deposition TiN films [25][26][27][28] , powder immersion reaction assisted coating method 29 , laser heating 30,31 as well as combined techniques 32,33 . Improvement on the mechanical and tribological properties of c.p.…”
Section: Introductionmentioning
confidence: 99%
“…In fact, this has been the subject of several investigations in clinical dentistry 4 . Among the surface treatment techniques, the most reported are: plasma assisted chemical vapor deposition 5 , conventional ion implantation [15][16][17][18][19] , plasma source nitrogen ion implantation 20 , conventional nitriding 21 , conventional plasma nitriding 22,23 , intensified plasma ion nitriding 24 , physical and chemical vapor deposition TiN films [25][26][27][28] , powder immersion reaction assisted coating method 29 , laser heating 30,31 as well as combined techniques 32,33 . Improvement on the mechanical and tribological properties of c.p.…”
Section: Introductionmentioning
confidence: 99%
“…to an average surface roughness less than 0.03 m. The the size of the TiN precipitates increases only slightly from microstructure of the alloy was globular (Figure 1 Zheng et al [12] Ti N 50 0.3 to 1.5 ␣-Ti -Ti 2 N 2 to 3 ␣-Ti ␦-TiN Krupa et al [13] Ti N 50 1,6 ␣-Ti ␦-TiN Hutchings [14] Ti6A14V N 90 3.5 ␣-Ti ␦-TiN Martinella et al [7] Ti6A14V N 100 5 ␣-Ti ␦-TiN Qiu et al [6,15] Ti6A14V N 50 0.9 to 6.6 ␣-Ti ␦-TiN 10 ␦-TiN* Vardiman [8,16] Ti6A14V N 75 2 ␣-Ti ␦-TiN Bolster et al [9] C 7 5 2 ␣-Ti ␦-TiC Vardiman and Kant [17] C 7 5 7 ␦-TiC* C 5 0 6 ␦-TiC* Wenzel et al [18] Ti C 30 6.5 ␣-Ti ␦-TiC Sugizaki et al [19,20] Ti incident projectile energies of E 0 ϭ 7.4 MeV and E 0 ϭ 7.6 MeV were employed for N-implanted and C-, Pt-, and Auimplanted specimens, respectively. Depth distributions of oxygen and of implanted atoms were calculated with the RUMP program [25] using literature data of elastic scattering cross sections.…”
Section: Experimental the Concentration Of Implanted Atoms Can Exmentioning
confidence: 97%
“…[5][6][7][8][9][10] The compounds in During nickel or palladium implantation at low ion energies ion-implanted titanium have been identified by various (E Յ 50 keV, Table I), intermetallic phases (Ti 2 Ni [19,20] and authors. [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22] A systematic screening of investigations using Ti 2 Pd or TiPd 2 [21] ) are formed. No information is available transmission electron microscopy (TEM) ( Table I) indicates from the literature concerning the phases formed during the influence of different implantation parameters on the implantation of noble metals at higher energies.…”
mentioning
confidence: 99%
“…Until recently, a pulsed D.C. plasma-duplex process [24] and an intensified glow discharge for industrial plasma nitriding process [25] were achieved.…”
Section: Tin Coatingsmentioning
confidence: 99%