Plasma treatment as a versatile tool for tuning of sorption properties of thin nanoporous carbon films

Slobodian, O. M.; Okholin, Pavel N.; Lytvyn, P. M.; Malyuta, S.V.; Khyzhun, O.Y.; Vasin, A. V.; Rusavsky, A. V.; Gomeniuk, Y. V.; Glotov, V.I.; Nazarova, Tamara M.; Gudymenko, O.; Nazarov, A. N.

doi:10.1016/j.apsusc.2020.148876

Cited by 16 publications

(10 citation statements)

References 47 publications

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“…The increase of the resistance of the sample during ammonia adsorption was reported earlier for nanoporous a-C:H films [6,7], and could be explained by a hole-depletion process [19,20]. Adsorbed ammonia molecule donates an electron to the p-type film inducing a decrease of charge carriers.…”

Section: Gas Sensing Properties Of Annealed Filmssupporting

confidence: 65%

“…On the contrary, the growth of a low-density porous carbon network needs low kinetic energy of the deposited particles, which is not easy to implement in a highly non-equilibrium plasma deposition process. Recently, a novel approach for plasma deposition of low-density nanoporous amorphous carbon films from methane and acetylene gas precursors was suggested [6,7]. The method uses a radio frequency planar magnetron system in chemical vapor deposition mode and therefore was called 'magnetron plasma enhanced chemical vapor deposition' (MPECVD).…”

Section: Introductionmentioning

confidence: 99%

“…Low discharge power and high working pressure provide stable low-density plasma near the substrateanode and eliminate the flux of energetic particles that are localized near the cathode surface. It was demonstrated that such deposition conditions enable the growth of carbon films with nanoscale porosity up to 60% [6] and with good sensing properties [7].…”

Section: Introductionmentioning

confidence: 99%

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Nanoscale morphology tailoring in plasma deposited CN _x layers

Vasin

Slobodian

Rusavsky

et al. 2023

J. Phys. D: Appl. Phys.

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Magnetron discharge plasma was applied for the synthesis of CNx thin layers using methane and nitrogen gas precursors. Incorporation of nitrogen in the carbon network resulted in dramatic evolution of growth morphology: from “buried” porous layer observed at low nitrogen incorporation, to aligned bundles of nanorods grown perpendicular to the substrate surface at maximum discharge power and nitrogen flow. The films deposited at the low discharge power and high nitrogen incorporation exhibited a mesoporous “sponge”-like morphology after vacuum annealing. Relevant physical mechanisms responsible for the formation of nano- and mesoshaped morphology are discussed in terms of the effects of internal mechanical stresses and plasma etching. In addition, the sensing properties of the “sponge”-like layer were preliminarily examined in water vapor and ammonia ambients. The CNx films showed enhanced sensitivity to ammonia and reverse electrical response to moisture in comparison with a nitrogen-free nanoporous carbon film that were assigned to modification of the electronic properties of nitridated surface.

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Section: Gas Sensing Properties Of Annealed Filmssupporting

confidence: 65%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Nanoscale morphology tailoring in plasma deposited CN _x layers

Vasin

Slobodian

Rusavsky

et al. 2023

J. Phys. D: Appl. Phys.

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“…In general, the following phrases are used in scientific works: "Plasma modification" or "Plasma treatment" -which can represent many, e. g.: plasma modification, plasma treatment or targeted plasma modificatio [6][7][8][9][10][11]. The potential for such targeted modification can be expressed in: activation and deactivation; sterilization (food); cleaning; tuning and enhancement; induction (e. g., electrostatic fibre crosslinking); possibly inducing an effect (physical mechanisms and interactions); change in absorbency, hydrophobicity / hydrophilicity.…”

Section: Introductionmentioning

confidence: 99%

Application of diffuse coplanar surface barrier plasma discharge to polymeric materials

Janík¹,

Kohutiar

Pajtášová³

et al. 2022

Materialwissenschaft Werkst

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The KPR 200 mm plasma reactor is a device designed for the surface modification of various materials. Such a modification occurs by applying a unique type of plasma – plasma generated on a ceramic dielectric. The ceramic dielectric is a durable system with which it is possible to continuously modify the surfaces of materials with such a plasma. The advantage of applying this unique type of plasma is that the modification of the materials occurs at room temperature and atmosphere. However, it is necessary to monitor and observe certain parameters, for example: the selected power, the exposure time of the surfaces of the modified materials, and the distance of the surface from the ceramic dielectric itself. Therefore, in the present paper, the effect of diffuse coplanar surface barrier discharge (DCSBD) plasma discharge on selected polymeric materials was investigated. Plasma impact assessment was also performed using image analysis, that could provide relevant information in the process of plasma‐chemical modification. Changes in the surfaces of the investigated thin polyvynil chloride material, before and after exposure to plasma discharge, were also observed (changes in contact angle, atomic force microscopy).

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“…It is a dry and clean method. [8][9][10] The common plasma methods used for fiber interface treatment include plasma etching, plasma activation, functionalization, plasma induced grafting, and plasma polymerization for polymer surface modification. [11][12][13] All kinds of gases can be used to produce plasma.…”

Section: Introductionmentioning

confidence: 99%

Interfacial performance and impact resistance of argon plasma treated UHMWPE/STF inter-ply hybrid composites

Liu

Wang

et al. 2021

Journal of Engineered Fibers and Fabrics

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This study explored the influence of low temperature glow discharged argon (Ar) plasma on interfacial performance and impact resistance of ultra-high molecular weight polyethylene (UHMWPE) inter-ply hybrid composites. The composites were composed of UHMWPE and meta-aramid plain woven laminates with shear thickening fluid (STF). Water contact angle and drop-weight resistance of the composites with various Ar plasma treatment parameters were tested to investigate the interfacial performance and impact properties of the composites. The tested treatment parameters of this study included treating time, treating power, and gas flow rate. It was found that the best interfacial adhesion of UHMWPE and the impact resistance of the composites was realized at the plasma treatment power of 100 W, treatment time of 150 s, and gas flow rate of 4 sccm. In the follow-up research, this study conducted ballistic test to further explore the bulletproof effect and application prospect of this material.

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Plasma treatment as a versatile tool for tuning of sorption properties of thin nanoporous carbon films

Cited by 16 publications

References 47 publications

Nanoscale morphology tailoring in plasma deposited CN _x layers

Nanoscale morphology tailoring in plasma deposited CN _x layers

Application of diffuse coplanar surface barrier plasma discharge to polymeric materials

Interfacial performance and impact resistance of argon plasma treated UHMWPE/STF inter-ply hybrid composites

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Plasma treatment as a versatile tool for tuning of sorption properties of thin nanoporous carbon films

Cited by 16 publications

References 47 publications

Nanoscale morphology tailoring in plasma deposited CN x layers

Nanoscale morphology tailoring in plasma deposited CN x layers

Application of diffuse coplanar surface barrier plasma discharge to polymeric materials

Interfacial performance and impact resistance of argon plasma treated UHMWPE/STF inter-ply hybrid composites

Contact Info

Product

Resources

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Nanoscale morphology tailoring in plasma deposited CN _x layers

Nanoscale morphology tailoring in plasma deposited CN _x layers