1976
DOI: 10.1002/pssa.2210370229
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Point defects and non-stoichiometry in HgSe

Abstract: Hall coefficients and electron conductivities of HgSe crystals annealed in a broad range of Hg and Se vapour pressures are measured at room and liquid nitrogen temperatures. The dominant point defects in HgSe are Hg interstitials and Se and Hg vacancies. Formation enthalpies of these defects are estimated by thermodynamical analysis and are compared with other II‐VI compounds. (P‐T‐x) diagram and existence region are obtained by the present annealing experiments. The electron concentration is expressed in term… Show more

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Cited by 24 publications
(9 citation statements)
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“…Large-grained HgSe ingots were grown from the elements (99.999% purity) by the Bridgman method in the same manner as described by Kuniazaki et al [13]. The samples cut to size (10 mm diameter x 1.5 mm) were mechanically polished, the final polish being obtained with 0.1 ym dimaeter particle alumina abrasive.…”
Section: Samples and Measurementsmentioning
confidence: 99%
“…Large-grained HgSe ingots were grown from the elements (99.999% purity) by the Bridgman method in the same manner as described by Kuniazaki et al [13]. The samples cut to size (10 mm diameter x 1.5 mm) were mechanically polished, the final polish being obtained with 0.1 ym dimaeter particle alumina abrasive.…”
Section: Samples and Measurementsmentioning
confidence: 99%
“…The background concentration could either be reduced or increased by annealing under various conditions, suggesting the presence of native defects such as vacancies and interstitials. 5 Sources of these donor defects need to be identified so that a process to eliminate them either during growth or through postgrowth annealing can be developed.…”
Section: Introductionmentioning
confidence: 99%
“…27 The dominant point defects in HgSe, indicated by thermodynamic analysis, are Hg interstitials and Schottky vacancies. HgSe is an n-type semimetal with charge carriers generated by ionized donor-type defects.…”
Section: Discussionmentioning
confidence: 99%