BaSnO3 thin films have
attracted significant
attention
due to their exceptional properties, specifically high electron mobility
at room temperature, for optoelectronic applications, such as pn diodes and field-effect transistors. However, the dominant
surface terminations of these films, particularly their dependence
on growth conditions and water leaching, remain elusive. Here, we
studied the impacts of growth conditions and water leaching on the
dominant surface terminations of BaSnO3 thin films by modeling
oxygen vacancies and water adsorption using first-principles calculations.
Our calculations show that, in the BaSnO3 model without
oxygen vacancies (corresponding to an oxygen-rich condition), the
required cleavage energy to remove the surface SnO2 (BaO·H2O) layer is lower than that required to remove the BaO (SnO2·H2O) layer. This implies that BaSnO3 thin films subjected to O2 annealing display a Ba-excess
surface without H2O leaching, whereas they have a Sn-excess
surface with H2O leaching. In contrast, the calculated
results for the BaSnO3 model with oxygen vacancies (corresponding
to an oxygen-deficient condition) show that the required cleavage
energy to remove the surface SnO2 (SnO2·H2O) layer is less than that required to remove the BaO (BaO·H2O) layer, suggesting that BaSnO3 thin films prepared
under oxygen-deficient conditions should exhibit Ba-excess surfaces
regardless of H2O leaching. This study offers useful insights
into achieving precise control over the surface properties of BaSnO3 films.