1997
DOI: 10.1109/68.623256
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Polarization insensitive 1.55-μm optical amplifier with GaAs delta-strained Ga/sub 0.47/In/sub 0.53/As quantum wells

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Cited by 15 publications
(6 citation statements)
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“…InGaAsP/InGaAs QWs with a strained δ layer of GaAs in the middle of the well have been studied in [74]. Such structures are used in semiconductor optical amplifiers (SOA) to achieve light polarization insensitivity by inducing energy degeneracy of light-hole and heavy-hole levels [14]. In this calculation Figure 6 shows the valence band dispersion for the GaAs δ-strain structure.…”
Section: Quantum Wells and Superlatticesmentioning
confidence: 99%
See 1 more Smart Citation
“…InGaAsP/InGaAs QWs with a strained δ layer of GaAs in the middle of the well have been studied in [74]. Such structures are used in semiconductor optical amplifiers (SOA) to achieve light polarization insensitivity by inducing energy degeneracy of light-hole and heavy-hole levels [14]. In this calculation Figure 6 shows the valence band dispersion for the GaAs δ-strain structure.…”
Section: Quantum Wells and Superlatticesmentioning
confidence: 99%
“…Modern applications, however, push nanostructures to dimensions and geometries where the EFA may not be as accurate as necessary [11]. For example, this is the case of quantum dots [12,13], strained delta-layers [14] or nanometre-scale silicon metal-oxide semiconductor fieldeffect transistors (MOSFETs) [15][16][17]. In the latter case, oxide dimension, channel thickness and channel length are such that the application of the EFA is highly questionable [18].…”
Section: Introductionmentioning
confidence: 99%
“…Nanoscale dimensions are common not only to Si MOSFETs, but also to other electronic devices such as, Si tunnelling devices (Thompson et al 1999) and Esaki double-barrier tunnelling structures, known as resonant tunnelling diodes (RTDs), where the active region can be as small as 20 nm. Similarly, multilayered structures for modern optoelectronic devices such as quantum-cascade lasers (QCLs), quantum-dots (Ledentsov et al 2000, Yoffe 2001) and strained delta-layers (Seiferth et al 1997) are all characterized by nanometric dimensions.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the difference between the TE and TM confinement factor enhances the polarization sensitivity of the gain. In order to achieve the desired polarization insensitivity, several SOA structures with strain between the different layers have been proposed [9][10][11]. The essential feature of the strain is to shift HH and LH bands independently.…”
Section: A Tight-binding Description Of Electronic and Optical Propermentioning
confidence: 99%
“…We investigate the differences in optical matrix elements and gain coefficient between the reference structure and one where 3 monolayers (ML) of InGaAs in the middle of the well are replaced by strained GaAs. The latter system has been shown to guarantee a good degree of polarization insensitivity [11].…”
mentioning
confidence: 99%