1997
DOI: 10.1109/3.605553
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Polarization-insensitive electroabsorptive modulation using interdiffused InGaAs(P)-InP quantum wells

Abstract: Abstract-This is a theoretical study to demonstrate the use of interdiffusion in the realization of polarization insensitivity at the band-edge. Two InGaAs-InP quantum well as-grown structures have been investigated: one with lattice-matched condition and the other with small as-grown tensile strain (0.15%). The interdiffusion is considered to take place on the Group V (As and P) sublattice only. As a result, a tensile strain is produced which merges the heavy-and light-hole states in order to achieve polariza… Show more

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Cited by 15 publications
(17 citation statements)
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“…It is interesting to noted that apart from the polarization-independent optical amplifier, the polarization-independent electroabsorption modulator has been demonstrated both experimentally [29] and theoretically [30] using the same principle, i.e., utilizing the tensile strain in wells induced by QW intermixing.…”
Section: Polarization-independent Optical Amplifiersmentioning
confidence: 99%
“…It is interesting to noted that apart from the polarization-independent optical amplifier, the polarization-independent electroabsorption modulator has been demonstrated both experimentally [29] and theoretically [30] using the same principle, i.e., utilizing the tensile strain in wells induced by QW intermixing.…”
Section: Polarization-independent Optical Amplifiersmentioning
confidence: 99%
“…The contrast ratio for a modulator is defined as the relative optical intensity modulation and is given as [15] CR (dB)…”
Section: Computational Considerationsmentioning
confidence: 99%
“…The relationship between and is given by (1) where is the angular frequency and is the speed of light. This model of has been described previously [13], [14] and is not the subject of the work reported here. The model for is described in [15] and [16].…”
Section: A Optical Properties Of Qwmentioning
confidence: 99%
“…Since the dielectric constants are different in each layer of the heterojunction structure, the derivation of the relevant quantities is rather complex. The potential difference across the depletion width is given by and, by using (13), and can be expressed in terms of the depletion layer thickness and the carrier density of the p-i-n structure. The integrated form of (13) is expressed as a quadratic equation for the depletion layer width and, thus, the solution for can be written as (14) where where is the dielectric constant, is the dopant concentration, and the subscripts , , and refer to the relevant layers of the p-i-n structure, respectively, is the thickness of the active region, and is an electronic charge.…”
Section: E the P-i-n Junction Depletion Regionmentioning
confidence: 99%
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