Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability

Xue, Gaopeng; Zhai, Qihang; Lu, Haiou; Zhou, Qian; Ni, Kai; Lin, Liyu; Wang, Xiaohao; Li, Xinghui

doi:10.1038/s41378-021-00256-z

Cited by 32 publications

(14 citation statements)

References 39 publications

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“…The multi-degree-of-freedom measurement needs to be used in combination, which will bring a certain assembly error to the measurement [21][22][23][24]; compared with the laser interferometer, the resolution of the grating encoder can reach the sub-nanometer, and it has a simpler and more compact optical path structure [25][26][27]. The measurement accuracy is based on the grating pitch used, and the production and processing technology of the grating is related to the manufacturing process of the grating [28][29][30][31], which is less affected by the environment, and has a relatively large advantage in the realization of six-degree-of-freedom measurement. At present, the grating encoder is developing in the direction of absolute type, multiple degrees of freedom, real-time measurement and large range [32][33][34][35].…”

Section: Introductionmentioning

confidence: 99%

An ultra-precision error estimation for a multi-axes grating encoder using quadrant photodetectors

Luo

Gao²,

Wang³

et al. 2022

Optical Metrology and Inspection for Industrial Applications IX

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For expanding the measurement range and improvement of accuracy of multi-axes grating encoder, a mathematical model of measurement angle and diffraction spot with QPD was established. We proposed a light spot position calculation method with consideration of both the optimized composite algorithm of laser beam feature of Gaussian distribution and the QPD diagonal algorithm. In this method, we use the piecewise polynomial fitting method to fit and solved the parameters of the traditional Infinite integral algorithm and the Boltzmann function fitting algorithm. Meanwhile, we introduce a weight factor and use the Composite algorithm to compensate the spot position error. Based on the given QPD model and the basic parameters of the laser beam, simulation works are carried out and results show that the maximum error of the spot position can reduce to be an order of 10-6 mm within the 2 mm measurement range using piecewise cubic polynomial fitting, around 10% of the traditional methods.

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Section: Introductionmentioning

confidence: 99%

An ultra-precision error estimation for a multi-axes grating encoder using quadrant photodetectors

Luo

Gao²,

Wang³

et al. 2022

Optical Metrology and Inspection for Industrial Applications IX

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“…Grating interferometer can reach sub-nanometer resolution and has the advantages of high compactness, high stability [13][14][15][16][17]. With the development of grating manufacturing [18][19][20] and processing technology, there are many studies on multi-degrees of freedom [21], large scales [22], absolutism [23] and so on [24]. Heterodyne grating interferometer is one of the state-of-the-art multi-DOF grating interferometers and it possesses many advantages such as high stability, high accuracy, low Abbe error.…”

Section: Introductionmentioning

confidence: 99%

A polarization adjustment module for frequency aliasing of heterodyne grating interferometer

Gao¹,

Zhu²,

Huang³

et al. 2022

Optical Metrology and Inspection for Industrial Applications IX

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Heterodyne grating interferometer is widely used in precision positioning due to its high precision and robustness. However, the polarization states of two frequency components in a dual-frequency laser are easy to overlap with each other because of the non-ideality of optical components. It will cause nonlinear error, which limits the measurement precision of the grating interferometer. To improve the frequency aliasing of heterodyne grating interferometer, a polarization adjustment module is proposed to adjust the polarization angle of the dual-frequency laser. The dual frequency system outputs two laser beams with different frequencies separately. The module realizes the polarization adjustment of the two frequency components through two groups of the polarizers and the half-wave plates (HWP). Finally, the polarization directions of two frequency components are orthogonal and combined by the beam splitter (BS). Thus, the nonlinear error caused by frequency aliasing is removed. The polarization adjustment module has the advantages of not changing the direction of the laser propagation and simple structure, which makes it easy to realize integration. It can provide a reference for the solution of frequency aliasing of heterodyne grating interferometer.

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“…The laser interference lithography technology is very suitable for the fabrication of periodic micro-nano structures similar to gratings. It has the advantages of high efficiency and low cost, and can achieve large-scale and rapid manufacturing [39][40][41][42][43].…”

Section: Introductionmentioning

confidence: 99%

A four-step laser interference lithography for patterning pixelated micro-polarizer array

Deng

Lü

Zhai

et al. 2022

Holography, Diffractive Optics, and Applications XII

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Pixelated micro-polarizer array is an attractive polarization imaging device because of its real-time fully detecting capability to Stokes parameters and high integration level. However, this micro-device is commonly fabricated by electron beam lithography, thus is often high-cost. Since periodic unit of this device is a 2×2 array of four types of onedimensional (1D) gratings with different orientations (0°, 45°, 90°, 135°), a low-cost grating fabrication technique, interference lithography (IL), is possible to be used to fabricate this device. In this research, a four-steps exposure patterning method of micro-polarizer array based on single Lloyd's mirror interferometer IL is developed. This interferometer is composed by two perpendicular parts: a mirror and a photoresist holder, and a 1D grating parallel with mirror can be fabricated in the exposure region on photoresist through lithography. A Cr-based mask, whose transparent pattern is a square array of square windows with 15×15 μm 2 window size and 17 μm window spacing, is introduced and clamped onto the photoresist to cut exposure region. In four exposure steps, each 15×15 μm 2 quadrant area of a polarizer array with 2 μm quadrant spacing will be exposed on photoresist, respectively. Between two exposure steps, mask and photoresist substrate need to be simultaneously horizontal rotated, to adjust the orientation of grating fabricated in next exposed quadrant on photoresist. Based on this method, we fabricated the single-state patterned micro-polarizer array, which effectively controls the cost and fabrication cycle. The experimental results show that the photoresist grating within a single window has stable structure, uniform period and good directivity.

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Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability

Cited by 32 publications

References 39 publications

An ultra-precision error estimation for a multi-axes grating encoder using quadrant photodetectors

An ultra-precision error estimation for a multi-axes grating encoder using quadrant photodetectors

A polarization adjustment module for frequency aliasing of heterodyne grating interferometer

A four-step laser interference lithography for patterning pixelated micro-polarizer array

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