2015
DOI: 10.1016/j.orgel.2015.05.012
|View full text |Cite
|
Sign up to set email alerts
|

Polyimide/polyvinyl alcohol bilayer gate insulator for low-voltage organic thin-film transistors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
7
1

Year Published

2017
2017
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 26 publications
(8 citation statements)
references
References 33 publications
0
7
1
Order By: Relevance
“…In addition, the surface morphology of the bilayer gate dielectric (high-K PVA/low-K PVP) allows more suitable growth of the pentacene grain because the PVP layer is deposited above the organic PVA surface instead of an inorganic ITO gate surface. Compared with other similar papers, the improved u FE in our study is about 1.12 cm 2 /Vs, significantly better than that of the reported papers previously [19][20][21][22]. The obvious performance improvement can be attributed to the high-K PVA/low-K PVP bilayer structure based upon the high-K characteristics of PVA and the hydrophobic surface of PVP.…”
Section: Introductioncontrasting
confidence: 64%
“…In addition, the surface morphology of the bilayer gate dielectric (high-K PVA/low-K PVP) allows more suitable growth of the pentacene grain because the PVP layer is deposited above the organic PVA surface instead of an inorganic ITO gate surface. Compared with other similar papers, the improved u FE in our study is about 1.12 cm 2 /Vs, significantly better than that of the reported papers previously [19][20][21][22]. The obvious performance improvement can be attributed to the high-K PVA/low-K PVP bilayer structure based upon the high-K characteristics of PVA and the hydrophobic surface of PVP.…”
Section: Introductioncontrasting
confidence: 64%
“…From these results, it was found that a single-layered diluted CGI (1:1) fabricated with a 3 krpm spin-coating speed is the optimized condition for the gate insulator. Compared to the conventional organic gate insulators, such as poly(methyl methacrylate), polyimide/polyvinyl alcohol, and poly(4vinylphenol), the single-layered diluted CGI (collodion:ethanol = 1:1) fabricated with a 3 krpm spin-coating speed exhibited high-dielectric strength (J < 10 −10 A/cm 2 in the range of 1.1 MV/cm) [15][16][17]. Thus, additional analyses were done, such as FESEM and analyses of the C-V curve of CGI and of the I-V curve of an a-IGZO TFT with CGI, to determine if a single-layered diluted CGI (1:1) fabricated with a 3 krpm spin-coating speed could be used for the gate insulator of a-IGZO TFTs.…”
Section: Resultsmentioning
confidence: 99%
“…3,4 A number of synthetic (e.g. polylactic acid (PLA), 5 polycaprolactone, 6 polyvinyl alcohol 7,8 ) and naturally occurring polymers (derived from paper, [9][10][11][12] silk, 13,14 gelatin, [15][16][17] cellulose-based polymers [18][19][20], all of which are derived from renewable resources, have found application as either substrate or dielectric material in the fabrication of electronic devices. Future developments, especially in the area of personalised electronic devices, will require the fabrication of electronic implants which are capable of undergoing controlled degradation within the human body.…”
Section: Introductionmentioning
confidence: 99%