Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization

Chen, Xiaohua; Tolbert, Laren M.; Henderson, Clifford L.; Hess, Dennis W.; Rühe, Jürgen

doi:10.1116/1.1409391

Cited by 9 publications

(5 citation statements)

References 24 publications

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“…A first hint might be the kinetic studies on surface-initiated photopolymerization (SIPP) by Dyer who reported that the increase of the polymer brush thickness with the (irradiation) polymerization time was nonlinear for the SIPP of styrene on AIBN-type functionalized SAMs, leading to the proposal of a complex four-stage growth model. In contrast, Rühe et al as well as our group reported on the SIPP of styrene from structured aromatic SAMs equipped with asymmetric azo-initiators. In both cases, the polymer brush layer increase was found to be a strictly linear function of the irradiation time.…”

Section: Introductionmentioning

confidence: 81%

Structured and Gradient Polymer Brushes from Biphenylthiol Self-Assembled Monolayers by Self-Initiated Photografting and Photopolymerization (SIPGP)

et al. 2009

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The self-initiated photografting and photopolymerization (SIPGP) of styrene, methyl methacrylate, and tert-butyl methacrylate on structured self-assembled monolayers (SAMs) of electron beam cross-linked omega-functionalized biphenylthiols SAMs on gold was investigated. Polymer brushes with defined thickness can be prepared on crosslinked benzyl-, phenyl-, hydroxyl-, and amino-functionalized SAMs, whereas non-cross-linked SAM regions desorb from the surface during the SIPGP process. By the preparation of brush gradients on different functionalized SAMs, it was demonstrated that the resulting polymer brush layer thickness is determined by the locally applied electron beam dosage. Defined micro-nanostructured polymer brush patterns can be prepared down to a size of 50 nm. Finally, it was shown that polymer brushes obtained by the SIPGP process have a branched architecture.

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Section: Introductionmentioning

confidence: 81%

Structured and Gradient Polymer Brushes from Biphenylthiol Self-Assembled Monolayers by Self-Initiated Photografting and Photopolymerization (SIPGP)

et al. 2009

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“…Later, the same group introduced a more suitable asymmetric azo-functionalized SAM featuring a methylmalonodinitrile and an aryl function with higher adsorption. 37,38 The thickness increase of the brush as a function of irradiation time was found to be linear with final thickness values of up to B400 nm after 24 h continuous UV irradiation.…”

Section: Uv Lithographymentioning

confidence: 93%

Patterned polymer brushes

2012

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This critical review summarizes recent developments in the fabrication of patterned polymer brushes. As top-down lithography reaches the length scale of a single macromolecule, the combination with the bottom-up synthesis of polymer brushes by surface-initiated polymerization becomes one main avenue to design new materials for nanotechnology. Recent developments in surface-initiated polymerizations are highlighted along with diverse strategies to create patterned polymer brushes on all length scales based on irradiation (photo- and interference lithography, electron-beam lithography), mechanical contact (scanning probe lithography, soft lithography, nanoimprinting lithography) and on surface forces (capillary force lithography, colloidal lithography, Langmuir-Blodgett lithography) (116 references).

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“…However, the polymer film thicknesses were limited to ≈21.5 nm as a result of the low extinction coefficient (i.e., low UV absorption and initiator efficiency) of AIBN. In subsequent work, [41,42] the surface-tethered AIBN-initiator was modified to improve UV absorption (and hence initiating efficiency, see entry 2 in Table 1) to give access to more densely grown PS films as thick as 500 nm. Patterned PS films with features as small as 1.5 µm were grown also on gold substrates, using disulfide groups for surface-attachment of the AIBN initiator groups (entry 3 in Table 1).…”

Section: Introductionmentioning

confidence: 99%

Surface Engineering with Polymer Brush Photolithography

Fromel

Pester

2020

Macromol. Rapid Commun.

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Surface‐tethered macromolecules, or polymer brushes, offer a unique platform for coating surfaces for a wide variety of applications. Surface‐initiated polymerization (SI‐P), through which polymer brushes can be grown directly from an initiator‐functionalized surface, offers a facile, highly customizable approach that is synergistic with photolithography. Using a variety of photolithography devices and SI‐Ps, complex polymer brush architectures can be fabricated with great spatial and temporal control. This article not only addresses techniques, advancements, applications, and possible future directions within the field of polymer brush photolithography, but it also provides resources to assist the reader in selecting the polymerization technique and photolithography device most conducive to a given endeavor.

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Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization

Cited by 9 publications

References 24 publications

Structured and Gradient Polymer Brushes from Biphenylthiol Self-Assembled Monolayers by Self-Initiated Photografting and Photopolymerization (SIPGP)

Structured and Gradient Polymer Brushes from Biphenylthiol Self-Assembled Monolayers by Self-Initiated Photografting and Photopolymerization (SIPGP)

Patterned polymer brushes

Surface Engineering with Polymer Brush Photolithography

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