Polymer photonic band-gaps fabricated by nanoimprint lithography

Reboud, V.; Kehoe, Timothy; Vivas, Javier Romero; Kehagias, N.; Zelsmann, M.; Alsina, F.; Torres, C. M. Sotomayor

doi:10.1016/j.photonics.2012.06.001

Cited by 5 publications

(2 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Among all these fabrication methods, NIL is one of the most promising technologies due to its high throughput, low-cost and high fidelity pattern transfer [17,18]. NIL techniques have already shown numerous applications in biology, electronics, photonics and magnetic devices [18][19][20][21]. Among NIL processes thermal-NIL (T-NIL), room temperature-NIL (RT-NIL), ultraviolet-NIL (UV-NIL) and combined nanoimprint and photolithography (CNP) can be mentioned.…”

Section: -Introductionmentioning

confidence: 99%

Thermal-nanoimprint lithography for perylenediimide-based distributed feedback laser fabrication

Retolaza

Juarros

Otaduy

et al. 2014

Microelectronic Engineering

View full text Add to dashboard Cite

In the present work thermal nanoimprint lithography of various commercial thermoplastic resists as matrixes for perylenediimides (PDIs) has been studied. This fabrication method reduced the number of fabrication steps, and therefore, the cost of the obtained distributed feedback (DFB) lasers. The optical properties of these devices are analyzed, aiming to optimize their performance. Thermal AbstractIn the present work thermal-nanoimprint lithography of various commercial

show abstract

Section: -Introductionmentioning

confidence: 99%

Thermal-nanoimprint lithography for perylenediimide-based distributed feedback laser fabrication

Retolaza

Juarros

Otaduy

et al. 2014

Microelectronic Engineering

View full text Add to dashboard Cite

show abstract

“…oblique angle deposition [3], nanoimprint lithography [4], electron or focused ion beam lithography [5], and two-photon photolithography [6]. In particular, the last one, also known as Direct Laser Writing (DLW), is becoming very popular nowadays, being the fast-prototyping method for fabrication of micrometer-scale objects.…”

Section: Introductionmentioning

confidence: 99%

Optical Microstructures Fabricated with Direct Laser Writing Technique

Kowalczyk¹,

Nawrot

Zinkiewicz³

2014

Latvian Journal of Physics and Technical Sciences

View full text Add to dashboard Cite

Three-dimensional photolitography, also known as Direct Laser Writing (DLW), is a powerful technique for fabrication of photonic microstructures. In this paper we present the basics of the relevant technology and discuss some features of the fabrication process. We also describe the experimental setup designed for making colour filters based on diffraction gratings, fibretip-integrated lens and anti-reflective coating designed for telecom wavelength (1550 nm). The results obtained demonstrate the DLW technique to be a promising fast prototyping fabrication method that may allow manipulating the properties of optical materials.

show abstract