2009
DOI: 10.1002/smll.200900938
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Polymer‐Protected Sub‐2‐nm‐Nanogap Fabrication for Biological Sensing in Near‐Physiological Conditions

Abstract: Polymer‐protected sub‐2‐nm nanogaps that are fabricated via a novel electrical stressing approach exhibit substantial ionic‐current reduction in near‐physiological conditions. These devices enable direct DNA detection in aqueous solution by utilizing assembly of oligonucleotide‐modified gold nanoparticles to the nanogap (see image).

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Cited by 18 publications
(10 citation statements)
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“…Next, a simple voltage sweep at 1 mV per 7 s was applied to the bowtie structures at room temperature using a Keithley 4200 parameter analyzer to electrically stress the connected electrodes until nanogaps have formed in all the electrodes (figure 1(a)). Sub-2 nm nanogaps and selfaligned PMMA hole structures of 200 nm diameter were simultaneously formed at the constriction sites, similar to what we achieved in [25] for a single constriction. The formation of the sub-2 nm nanogaps was due to thermally assisted electromigration of the gold atoms, while Joule heating caused a rapid temperature rise at the constriction site leading to a local ablation of the PMMA, which resulted in a hole structure right on top of the nanogap (figure 1(b)).…”
Section: Fabrication Of Polymer-protected Nanogap Arrayssupporting
confidence: 80%
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“…Next, a simple voltage sweep at 1 mV per 7 s was applied to the bowtie structures at room temperature using a Keithley 4200 parameter analyzer to electrically stress the connected electrodes until nanogaps have formed in all the electrodes (figure 1(a)). Sub-2 nm nanogaps and selfaligned PMMA hole structures of 200 nm diameter were simultaneously formed at the constriction sites, similar to what we achieved in [25] for a single constriction. The formation of the sub-2 nm nanogaps was due to thermally assisted electromigration of the gold atoms, while Joule heating caused a rapid temperature rise at the constriction site leading to a local ablation of the PMMA, which resulted in a hole structure right on top of the nanogap (figure 1(b)).…”
Section: Fabrication Of Polymer-protected Nanogap Arrayssupporting
confidence: 80%
“…We previously reported the realization of protected sub-2 nm nanogaps through a process of electromigration and concurrent self-aligned polymer ablation in a polymethylmethacrylate (PMMA)-coated constricted electrode structure, using a simple slow voltage sweep [25]. In the present work, we demonstrate that an array of such protected nanogaps can be fabricated by carrying out the electromigration process using a parallel connection of multiple constricted electrode structures.…”
Section: Introductionmentioning
confidence: 72%
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“…32,33 In a typical experiment, we first patterned electrodes with a constriction by electron beam lithography. 32,33 In a typical experiment, we first patterned electrodes with a constriction by electron beam lithography.…”
mentioning
confidence: 99%