Polymerization of organosilicon compounds on a metal surface using a glow discharge

Tkachuk, B. V.; Bushin, V.V.; Kolotyrkin, V.M.; Smetankina, N. P.

doi:10.1016/0032-3950(67)90030-5

Cited by 13 publications

(4 citation statements)

References 7 publications

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“…Similarly, HMDS polymer has a C/St ratio of about 2, while the monomer has a C/St ratio of 3. Tkachuk et al (6) have found C/St ratios of 1.85 and 1.59 for polymer prepared from HMDS by the action of gas discharges, as well as a dependence of this ratio on the presence of argon. Further evidence of major structural reorganization occurring in the transition from monomer to polymer is found in the infrared spectra.…”

Section: Resultsmentioning

confidence: 99%

“…The solubility of sodium oxide in sodium is low (~1200 ppm) and the solution may therefore be considered as dilute. Hence Henry's law is applicable and the concentration of oxygen in solution is proportional to its activity (6). The value of Eo depends on the reference electrode used and is determined by the free energy of formation of sodium oxide from the reaction of sodium with the reference electrode; when a sodium-sodium oxide reference is used its value is theoretically zero.…”

Section: Electrochemistrymentioning

confidence: 99%

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Organosilicon Films Formed by an RF Plasma Polymerization Process

Vasile¹,

Smolinsky²

1972

J. Electrochem. Soc.

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The purpose of this research was to develop a plasma polymerization process for producing polymeric films and to achieve an understanding of the chemistry involved. A technique for the production of polymer coatings from a capacitively coupled RF plasma is presented. The resulting films contain trapped free radical sites which can react with oxygen and nitric oxide. The rate of polymer formation is a complicated function of power input, total system pressure, and partial pressure of monomer. The rates of reaction differ for different monomers under identical reaction conditions. The stoichiometry and infrared spectra of the polymers indicate that considerable fragmentation and bond reorganization of the monomeric starting material occurs during the polymerization process. A mechanism is proposed to account for conversmn of monomer to polymer by formation and fragmentation of ionic species in the discharge. Neutralization of the ionic fragments at the walls yields radicals which can react with adsorbed species and be cross-linked to form polymer.

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Section: Resultsmentioning

confidence: 99%

Section: Electrochemistrymentioning

confidence: 99%

Organosilicon Films Formed by an RF Plasma Polymerization Process

Vasile¹,

Smolinsky²

1972

J. Electrochem. Soc.

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“…30, 36, 90–94 However, it was found that with rising pressure (>133 Pa), powder formation occurs and the “polymer” formation is located in the gas phase (Figure 3). 16, 29, 95–98…”

Section: Plasma Polymerization In Adsorbed‐ or Gas Phasesmentioning

confidence: 99%

“…Compositions and structures of plasma polymers were investigated by bulk‐ and surface‐analytical methods. Bulk methods used were IR transmission spectroscopy,7, 41 dielectric relaxation spectroscopy (DRS),40, 99, 100, 130, 131 electron spin resonance (ESR),13–136 thermo‐luminescence (TL),137, 138 thermo‐gravimetry (TG),13, 139, 140 1 H‐ and broadline NMR 42, 135. All results of bulk analyses reflect the total absence of structural and compositional regularity in plasma polymers, regardless of whether they are produced by cw‐ or pulsed plasma.…”

Section: Structures Of Plasma Polymersmentioning

confidence: 99%

Mechanisms of Plasma Polymerization – Reviewed from a Chemical Point of View

Friedrich

2011

Plasma Processes & Polymers

369

336

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Several reaction mechanisms have been proposed for the formation of plasma polymers, such as monomer fragmentation followed by poly‐recombination into randomly structured and crosslinked films; fragmentation, accompanied by the formation of acetylene or other film‐forming intermediates and deposition of polystyrene‐like material; plasma‐initiation of a radical chain‐growth polymerization; and ion‐molecule reactions, as well as ionic chain‐growth polymerization. The bulk structure of plasma polymers is completely irregular, far from that of conventional polymers. The retention of functional groups during plasma polymerization tends to be greater than that of the entire monomer structure found again as an intact repeat unit in the resulting plasma polymer. An alternative method for depositing ultra‐thin, pin‐hole free coatings, ones that possess regular structures, is by electrospray ionization (ESI) of pre‐fabricated polymers.

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