Polymers in electron beam and X-Ray lithography

Schnabel, W.; Sotobayashi, Hideto

doi:10.1016/0079-6700(83)90008-4

Cited by 41 publications

(14 citation statements)

References 107 publications

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“…This damage can either limit their utility or provide the basis for useful technologies such as x-ray lithography (2,3) or radiation cross-linking of polymers (3). Understanding the mechanisms of the damage accompanying exposure to x-rays is helpful in designing materials and environments in which this exposure yields the desired results.…”

Section: -Rays Damage Organic Materialsmentioning

confidence: 99%

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X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

Laibinis

Graham

Biebuyck

et al. 1991

Science

141

126

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The relative importance of x-rays alone and of x-ray-generated primary and secondary electrons in damaging organic materials was explored by use of self-assembled monolayers (SAMs) on multilayer thin-film supports. The substrates were prepared by the deposit of thin films of silicon (0, 50, 100, and 200 angstroms) on thick layers of gold (2000 angstroms). These systems were supported on chromium-primed silicon wafers. Trifluoroacetoxy-terminated SAMs were assembled on these substrates, and the samples were irradiated with common fluxes of monochromatic aluminum K(alpha) x-rays. The fluxes and energy distributions of the electrons generated by interactions of the x-rays with the various substrates, however, differed. The substrates that emitted a lower flux of electrons exhibited a slower loss of fluorine from the SAMs. This observation indicated that the electrons-and not the x-rays themselves-were largely responsible for the damage to the organic monolayer.

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Section: -Rays Damage Organic Materialsmentioning

confidence: 99%

“…l/A is directly related to the probability of an electron interacting inelastically with a medium. The substrates (1)(2)(3)(4)(5) are defined in the legend to Fig. 2. CF3C0,-terminated monolayers on the various substrates to Al K, x-rays.…”

Section: -Rays Damage Organic Materialsmentioning

confidence: 99%

X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

Laibinis

Graham

Biebuyck

et al. 1991

Science

141

126

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“…The first problem is solved by a highly controllable and simple method for protecting the PS spheres from chemical attack and melting, by cross-linking the PS spheres using high doses of electron-beam irradiation [17,18]. As this irradiation is performed in an electron-beam lithography system, the irradiation area can be controlled to be an arbitrary shape, with minimum lateral dimensions limited by the typical e-beam lithography resolution limits to below 100 nm resolution.…”

Section: Introductionmentioning

confidence: 99%

Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

Tian¹,

Isotalo²,

Konttinen³

et al. 2017

J. Phys. D: Appl. Phys.

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Abstract. We demonstrate a method to fabricate narrow, down to a few micron wide metallic leads on top of a three-dimensional colloidal crystal self-assembled from polystyrene (PS) nanospheres of diameter 260 nm, using electron-beam lithography. This fabrication is not straightforward due to the fact that PS nanospheres cannot usually survive the harsh chemical treatments required in the development and lift-off steps of electron-beam lithography. We solve this problem by increasing the chemical resistance of the PS nanospheres using an additional electron-beam irradiation step, which allows the spheres to retain their shape and their self-assembled structure, even after baking to a temperature of 160 degrees C, the exposure to the resist developer and the exposure to acetone, all of which are required for the electron-beam lithography step. Moreover, we show that by depositing an aluminum oxide capping layer on top of the colloidal crystal after the e-beam irradiation, the surface is smooth enough so that continuous metal wiring can be deposited by the electron-beam lithography. Finally, we also demonstrate a way to self-assemble PS colloidal crystals into a microscale container, which was fabricated using direct-write three-dimensional laser-lithography. Metallic wiring was also successfully integrated with the combination of a container structure and a PS colloidal crystal. Our goal is to make a device for studies of thermal transport in 3D phononic crystals, but other phononic or photonic crystal applications could also be envisioned.

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“…Halogenated polystyrene is one of the negative resists sensitive to deep UV [1]. Usual halogenated derivatives of simple polystyrenes have advantages of good transparency at 249 nm and good dry etching durability.…”

Section: Introductionmentioning

confidence: 99%

Negative resist based on phenol protection.

Ito

Sakata

Yamashita

1991

J. Photopol. Sci. Technol.

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Negative resist system, consisting of organic polyhalides and poly(hydroxystyrene), has been examined for KrF excimer laser lithography. Several trichloromethylated 1,3,5triazines and trichloromethylated benzenes are suitable to the photoactive compounds for this system. The resist using trichloromethylated benzene has a sensitivity of 66 mJ/cm2 to KrF excimer laser and a resolution of 0.38 µm. The insolubilization mechanism of this system has been clarified. Hydroxyl groups of poly(hydroxysyrene) are protected with the acyl groups derived from trichloromethyl groups of photoactive polyhalides under deep UV irradiation. The polarity change caused by the conversion of poly(hydroxystyrene) to the esterified derivative. Insolubilization in an alkaline solution of the exposed area of the resist film is based on such phenol protection reaction.

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Polymers in electron beam and X-Ray lithography

Cited by 41 publications

References 107 publications

X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

Negative resist based on phenol protection.

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Polymers in electron beam and X-Ray lithography

Cited by 41 publications

References 107 publications

X-ray Damage to CF 3 CO 2 -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

X-ray Damage to CF 3 CO 2 -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

Negative resist based on phenol protection.

Contact Info

Product

Resources

About

X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

X-ray Damage to CF ₃ CO ₂ -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons