Porous Silicon Bragg Reflector and 2D Gold-Polymer Nanograting: A Route Towards a Hybrid Optoplasmonic Platform

Abstract

Photonic and plasmonic systems have been intensively studied as an effective means to modify and enhance the electromagnetic field. In recent years hybrid plasmonic–photonic systems have been investigated as a promising solution for enhancing light-matter interaction. In the present work we present a hybrid structure obtained by growing a plasmonic 2D nanograting on top of a porous silicon distributed Bragg reflector. Particular attention has been devoted to the morphological characterization of these systems. Electron microscopy images allowed us to determine the geometrical parameters of the structure. The matching of the optical response of both components has been studied. Results indicate an interaction between the plasmonic and the photonic parts of the system, which results in a localization of the electric field profile.

Implementation of an inexpensive cathodoluminescence and electron beam induced current image generator coupled to a scanning electron microscope

“…The wavelength of the light emitted depends on the bandgap energy and allowed electronic states for a given material. This is the case for p-Si, which is a wellknown luminescent material compatible with microelectronic technology and it has applications on flexible luminescent devices passivated with some polymers [18]- [21]. Hence p-Si is a substrate for test the CL configuration and the emission has been reported with a large bandwidth between 400 to 800 nm in PL.…”

A fibrinogen biosensing platform based on plasmonic Ga nanoparticles and aminosilane–titanate antibody trapping

“…In any case, such thickness is compatible with retention of a sensing capability in a nanostructured system exhibiting localized surface plasmons (Pellacani et al, 2019). As we can observe in Figure 6a, the thickness of the silane–protein layer in a flat model gets saturated for concentrations greater than 66.67 µg/mL (444.70 nM).…”

Plasma Fabrication and SERS Functionality of Gold Crowned Silicon Submicrometer Pillars

“…Surface engineering techniques are increasingly spanning into the field of optics, allowing the design of intricate material configurations with photonic [1], luminescent [2], photochemical [3], plasmonic [4], photovoltaic [5], or even dual [6] properties. The engineering of these structures requires a sequential fabrication in which, most often, a plasma-processing step is involved.…”

“…In fact, both metallic islands and cavity structures in metals exhibit localized surface plasmons (LSPs) upon appropriate light excitation, a second type of plasmonic wave with much higher sensitivity in view of the extension of the electromagnetic field into the surrounding environment. There exists, thus, many reports on the plasma sputtering processing of discontinuous metallic thin films exhibiting LSPs due to the presence of islands [22,23] and/or cavities [6,24]. In the formation of micro-array technologies, the plasmonic surfaces are complemented with dielectric materials that incorporate a surface antifouling behavior, which provide a contrast during imaging acquisition [25,26].…”

“…The plasma processing steps include the reactive ion etching (RIE) of Si through the colloidal monolayers and the plasma sputtering deposition. RIE is an extremely versatile technique for the micro and nanoscale definition of devices exhibiting photonic [37], plasmonic [38], or even dual (photonic and fluorescent [39], photonic and plasmonic [6]) optical properties. On the other hand, plasma sputtering is considered the most versatile technique for the deposition of metallic thin films (elemental metals [40], ceramic nitride metals [41], metal-organic composites [42,43], and transparent conductive oxides [44]), being crucial for the activation of a wide spectrum of optical devices.…”