“…Micro-structured Ta 2 O 5 film can be produced by a wide number of techniques, including methods such as chemical solution deposition, such as sol–gel (e.g., [ 4 ]) and polymer-assisted deposition (e.g., [ 6 , 20 ]); physical vapor deposition, such as magnetron sputtering (e.g., [ 21 , 33 , 34 , 35 ]) and pulsed laser deposition (e.g., [ 3 ]); chemical vapor deposition (e.g., [ 13 , 22 ]); electrochemical-processes-anodization (e.g., [ 25 , 32 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 ]); and micro-arc oxidation (e.g., [ 23 ]). One of the most common electrochemical processes used for Ta 2 O 5 film production is anodization, which is a low-cost and industrialized technique, although it uses environmentally harmful chemicals [ 44 , 45 ].…”