Possibility for the form correction of X-ray mirrors by reactive ion-beam etching

Abstract

Key parameters for the reactive ion beam etching of glass, quartz and silicon are studied. The dependence of the etching rate on chamber pressure and etching time is investigated. The etching zone has the form of a long (~50 mm), narrow (~1 mm) strip with depth homogeneity at a level of 0.2%. Such a zone is a handy tool for correcting the shape of cylindrical surfaces.

CAE/CAI/CAM system supporting the production of X-ray optical components

“…In this study, aspherical cylindrical surfaces were manu factured via polishing by small size tools. This tech nology has been known for several decades [1,2]. It is the author's opinion that polishing by small size tools yields a successful combination of process efficiency and an acceptable level of quality at reasonable costs for equipment and workplace facilities.…”

“…As a rule, their surface is an off axis parabola or an ellipse with a bending deflection from several tens to several hundreds of micrometers. At present, the surface shape error must be on the order of one angular second, and the roughness must be several angstroms [1][2][3][4]. The finishing stages can involve both abrasive treatment [5] and more complex technologies, e.g., plasma ion polishing [4].…”

A new technology of thermoplastic glass bending for the manufacture of cylindrical surfaces of hard X-ray range mirrors

“…Previously, we have developed a number of methods for manufacturing cylindrical mirrors with a given surface shape: methods of thermoplastic and elastic bending of glass, as well as the replica method, especially effective in the manufacture of large batches of mirrors [5][6][7][8][9]. To implement the replica method, a template is required that defines the shape of the manufactured surface.…”