Post-annealing temperature dependence of infrared absorption enhancement of polymer on evaporated silver films

Suzuki, Y.; Ojima, Y.; Fukui, Yuya; Fazyia, H.; Sagisaka, Kaoru

doi:10.1016/j.tsf.2006.08.029

Cited by 28 publications

(16 citation statements)

References 17 publications

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“…It is widely accepted that the metal layer is the key in determining the sheet resistance of the tri-layer films [2,19,20]. And Ag film will be oxidized in an oxidized atmosphere [21].…”

Section: Resultsmentioning

confidence: 99%

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Lin

Lan

et al. 2014

Thin Solid Films

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“…It is widely accepted that the metal layer is the key in determining the sheet resistance of the tri-layer films [2,19,20]. And Ag film will be oxidized in an oxidized atmosphere [21].…”

Section: Resultsmentioning

confidence: 99%

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Lin

Lan

et al. 2014

Thin Solid Films

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“…Ag films due to their noble optical properties have attracted much attention [36][37][38]. In previous reports, the size and shape of silver nanoparticles affect the optical properties of Ag films [39].…”

Section: Electrical and Optical Propertiesmentioning

confidence: 99%

Rapid Thermal Annealing at the Temperature of 650°C Ag Films on SiO₂ Deposited STS Substrates

Kim

2017

Appl. Sci. Converg. Technol.

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Flexible opto-electronic devices are developed on the insulating layer deposited stainless steel (STS) substrates. The silicon dioxide (SiO 2) material as the diffusion barrier of Fe and Cr atoms in addition to the electrical insulation between the electronic device and STS is processed using the plasma enhanced chemical vapor deposition method. Noble silver (Ag) films of approximately 100 nm thickness have been formed on SiO 2 deposited STS substrates by E-beam evaporation technique. The films then were annealed at 650 o C for 20 min using the rapid thermal annealing (RTA) technique. It was investigated the variation of the surface morphology due to the interaction between Ag films and SiO 2 layers after the RTA treatment. The results showed the movement of Si atoms in silver film from SiO 2. In addition, the structural investigation of Ag annealed at 650 o C indicated that the Ag film has the material property of p-type semiconductor and the bandgap of approximately 1 eV. Also, the films annealed at 650 o C showed reflection with sinusoidal oscillations due to optical interference of multiple reflections originated from films and substrate surfaces. Such changes can be attributed to both formation of SiO 2 on Ag film surface and agglomeration of silver film between particles due to annealing.

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“…Ag films have attracted much attention owing to their peculiar optical properties [33][34][35]. In previous investigations, it was found that the size and shape of silver nanoparticles, and the related surface roughness of the films, affect the optical properties of Ag films [36].…”

Section: Optical Propertiesmentioning

confidence: 99%

Effects of rapid thermal annealing for E-beam evaporated Ag films on stainless steel substrates

Kim

Lee

et al. 2015

Surface and Coatings Technology

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Post-annealing temperature dependence of infrared absorption enhancement of polymer on evaporated silver films

Cited by 28 publications

References 17 publications

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Rapid Thermal Annealing at the Temperature of 650°C Ag Films on SiO₂ Deposited STS Substrates

Effects of rapid thermal annealing for E-beam evaporated Ag films on stainless steel substrates

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Post-annealing temperature dependence of infrared absorption enhancement of polymer on evaporated silver films

Cited by 28 publications

References 17 publications

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Effect of thermal annealing on the performance of WO 3 –Ag–WO 3 transparent conductive film

Rapid Thermal Annealing at the Temperature of 650°C Ag Films on SiO2 Deposited STS Substrates

Effects of rapid thermal annealing for E-beam evaporated Ag films on stainless steel substrates

Contact Info

Product

Resources

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Rapid Thermal Annealing at the Temperature of 650°C Ag Films on SiO₂ Deposited STS Substrates