Practical Applications of Ion Implantation

Abstract

The process of ion implantation, already widely adopted for the reliable manufacture of semiconductor devices, has now been developed as a highly sophisticated method of tailoring the surfaces of materials to resist wear and c?rrosion. Mechanisms exist that can bring about long-lastmg improvements in performance despite the s~allow penetration of the ions. Equipment has been deslgned to reduce the cost of the process, so as to be competitive with more conventional metal-finishing treatments.This article emphasizes applications to engineering tools and components already used in production. Factors of threeto five-fold increases in life are achieved in a variety of materials including steels and cemented carbides.Some developments which seem likely to extend widely the applications of the process are described.