Precise Chrome Etching in Downstream Chlorine Plasmas with Electron Depletion Through Negative Ion Production

Ichikı, Takanori; Takayanagi, Satoshi; Horiike, Yasuhiro

doi:10.1149/1.1394055

Cited by 25 publications

(19 citation statements)

References 4 publications

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“…A reverse microcapillary resist pattern as a mask for etching of the Cr film was printed by a photolithography technique. The Cr film was dry-etched employing ICP (inductively coupled plasma) with Cl 2 and 30% O 2 mixture [10]. A microchannel of a 30 mm630 mm cross-section was then dry-etched by the NLD (neutral loop discharge) [11] employing a C 3 F 8 /70% CF 4 mixture and the Cr film mask [12] on the quartz plate.…”

Section: Introductionmentioning

confidence: 99%

pH Change of buffer solution in a microcapillary chip and its suppression

et al. 2002

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During the electrophoresis separation of B- and T-cells from lymphocytes employing a microcapillary chip, they were found to become inactive in the reservoir after a short time. This was caused by the buffer solution becoming alkaline due to electrolysis. This was considered to take place in chips with small reservoir volumes. The pH change was confirmed by the ISFET (ion-sensitive field effect transistor) embedded in the chip. To suppress the pH change, two methods were studied. One is the insertion of a salt bridge just in front of and behind the capillary, thus introducing an electric potential but stopping flow of the acid and alkaline solutions into the capillary. The other is neutralization of the alkaline solution in the reservoir by injecting the acid solution produced in another capillary with the same structure by employing an electroosmotic flow (EOF) pump. Both methods achieved no pH change during electrophoresis measurements in the microcapillary.

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Section: Introductionmentioning

confidence: 99%

pH Change of buffer solution in a microcapillary chip and its suppression

et al. 2002

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“…A Cr film masked by a resist (ZEP 7000; Nihon Zeon), delineated by electron beam (EB) lithography was etched by a Cl 2 inductively coupled plasma (ICP) [21] at 30 mTorr in the 18 cm downstream region from the antenna. The designed capillary patterns were dry-etched by employing a planar-type neutral loop discharge (NLD) [22] with a mixture of CF 4 and C 3 F 8 and a masking material of Cr with 0.1 mm thickness. The etching pressure was 2 mTorr.…”

Section: Chip Fabricationmentioning

confidence: 99%

Low‐voltage electroosmosis pump for stand‐alone microfluidics devices

et al. 2003

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Two types of low-voltage electroosmosis pumps were developed using microfabrication technology for usage in handy or stand-alone applications of the micrototal analysis systems (micro-TAS) and the lab-on-a-chip. This was done by making a thin (< 1 microm) region in the flow path and by only applying voltages near this thin region using electrodes inserted into the flow path. The inserted electrodes must be free from bubble formation and be gas-tight in order to avoid pressure leakage. For these electrodes, Ag/AgCl or a gel salt bridge was used. For patterning the gel on the chip, a hydrophilic photopolymerization gel and a photolithographic technique were optimized for producing a gel with higher electric conductivity and higher mechanical strength. For high flow rate application, wide (33.2 mm) and thin (400 nm) pumping channels were compacted into a 1 mm x 6 mm area by folding. This pump achieves an 800 Pa static pressure and a flow of 415 nL/min at 10 V. For high-pressure application, a pump was designed with the thin and thick regions in series and positive and negative electrodes were inserted between them alternatively. This pump could increase the pumping pressure without increasing the supply voltage. A pump with 10-stage connections generated a pressure of 25 kPa at 10 V.

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“…6 [20]. A Cr film masked by a resist (ZEP 7000; Nihon Zeon) delineated by an electron beam (EB) lithography that was etched by Cl 2 inductively coupled plasma (ICP) at 30 mTorr in the 18 cm region downstream from the antenna, where the Cr film etch rate selectivity to the EB resist was improved [21]. Nanocapillary patterns with 0.6 mm60.6 mm cross-sections were dry-etched employing a planar type neutral loop discharge (NLD) [22] with a mixture of CF 4 and C 3 F 8 and a masking material of Cr (0.1 mm thickness).…”

Section: Fabricationmentioning

confidence: 99%

Investigation of the possibility of geometrical electrophoresis

et al. 2002

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We investigate the possibility of geometrical electrophoresis, which is based on nanofabrication techniques. (GEE) utilizes geometrical effects during electrophoresis, which are generated by physical interactions between walls and a macromolecule confined in spaces smaller than the Flory radius. When a polymer is injected into a small space, confinement energy is usually required. However, the confinement energy form depends on the geometry of the space. In the case of electrophoresis, the electric field itself changes depending on the geometry. Using a nanofabricated quartz chip with a curved channel, we investigated electrophoretic behavior of high molecular weight DNA based on the curvature effect.

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Precise Chrome Etching in Downstream Chlorine Plasmas with Electron Depletion Through Negative Ion Production

Cited by 25 publications

References 4 publications

pH Change of buffer solution in a microcapillary chip and its suppression

pH Change of buffer solution in a microcapillary chip and its suppression

Low‐voltage electroosmosis pump for stand‐alone microfluidics devices

Investigation of the possibility of geometrical electrophoresis

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