Precise formation of nanoscopic dots on polystyrene film using z-lift electrostatic lithography

Abstract

Z -lift electrostatic lithography on thin (10–50nm) polystyrene (PS) films is discussed. The height of nanostructures can be controlled via mechanically drawing or depressing the cantilever height (z-lift) during the application of a voltage. Since polymer is not removed or crosslinked during structure formation, the features are erasable. Various aspects such as voltage doses, film thickness, z-lift height, and rate are explored. Structure height formation relies mainly on, and is proportional, to the z-lift magnitude; however, only a narrow range of voltages yields structures for any given film thickness. Structures ranging from 0–10nm are produced on a 40nm thick PS film using −36V by varying the z-lift on a 0.1–0.9N∕m cantilever from −20nm to +400nm.

Density-functional description of water condensation in proximity of nanoscale asperity

“…1,2,3,4,5,6,7,8,9,10 The formation of the water meniscus affects strongly the force-distance measurements and AFM imaging resolution, 1,2 provides nanoscale electrochemical cell for SPM oxidation of semiconductors and metals, 3,4 serves as ink transport channel for dip-pen nanolithography 5,6 and plays an essential role in AFM-assisted electrostatic nanolithography (AF-MEN) of thin polymeric films. 7,8,9,10 Direct experimental observations of meniscus formation in the AFM tip -surface junction are complicated due to nanometer-scale size of the region of interest. There are no optical tools available for this purpose due to the wavelength limitation.…”

Microphase Separation in Unsaturated Polyester/ PEO‐PPO‐PEO Block Copolymer Mixtures Containing Carbon Nanotubes

“…Among several techniques used to pattern polymers on the nanoand submicrometer scale, 5,6 block copolymers can provide an effective way to control the spatial distribution of nanofillers in the polymer matrix, as they can be confined to one of the microphase-separated domains of the block copolymer. 7,8 On the other hand, as a result of their technological relevance, the use of carbon nanotubes (CNT) has received much attention since their discovery due to their unique properties and potential applications such as remarkable strength and stiffness 9 and superior electrical and thermal conductivity.…”

Multidimensional electrochemical imaging in materials science

“…Nanometer sized deposits can be achieved mainly by nanolithographic approaches. Next to surface probe microscopy techniques, for example dip-pen nanolithography (DPN), electrochemical DPN, electrostatic nanolithography, and electron beam lithography [236][237][238][239], nanolithography based on C-AFM has been extensively used for nanopatterning of monomer and precursor polymer films [240][241][242][243][244], in contrast with DPN and electrostatic nanolithography, in which monomer inks or electrolyte-saturated films are used [236,237,241]. C-AFM enables direct preparation of polymer films by electrochemical means on spin-cast monomers under ambient temperature and humidity conditions.…”