2012
DOI: 10.3367/ufne.0182.201207c.0727
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Precision imaging multilayer optics for soft X-rays and extreme ultraviolet bands

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Cited by 52 publications
(12 citation statements)
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“…For the number of electron in a bunch about 10 10 needful statistics may be obtained during some hours. Using of Mo/Be or Mo/Si X-ray mirrors with wave length about 15 nm may increase the value and the reflection coefficient up to 40 μm and 60% respectively [27]. Unfortunately these X-ray mirrors have the energy resolution about some percent; therefore we will obtain an increasing of the angular size of the reflection spot about ten times.…”
Section: Calculation Results and Discussionmentioning
confidence: 99%
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“…For the number of electron in a bunch about 10 10 needful statistics may be obtained during some hours. Using of Mo/Be or Mo/Si X-ray mirrors with wave length about 15 nm may increase the value and the reflection coefficient up to 40 μm and 60% respectively [27]. Unfortunately these X-ray mirrors have the energy resolution about some percent; therefore we will obtain an increasing of the angular size of the reflection spot about ten times.…”
Section: Calculation Results and Discussionmentioning
confidence: 99%
“…The most optimal way is using a Cr/Sc multilayer radiator with the lattice parameter = 2.34 nm turned on the angle Θ = 45 • as in the experiment [25]. Similar mirrors with 250 layers provide a reflection coefficient about 10%, [27] and angular size of the reflection spot Δ = Δ ∕ ⋅ (Θ ) ≈ 4 mrad. As for zero impact parameter transition radiation intensity and diffraction radiation one have approximately the same order of magnitude [17] we may estimate transition radiation yield.…”
Section: Calculation Results and Discussionmentioning
confidence: 99%
“…Chemical and diffusion interactions between adjacent layers can reduce the reflectance of mirrors. Development of highly reflective mirrors is founded on thorough selection of contacting materials with the purpose of suppressing these interactions [6]. However, some promising structures like Mo/Si (for λ = 13.5 nm) and La/B 4 C (for λ = 6.7 nm) exhibit strong interlayer interactions resulting in broadening of interfaces and asymmetrical form of layer profiles and in decreasing of the density of the layer of a heavier element.…”
Section: Introductionmentioning
confidence: 99%
“…It allows preventing the degradation of mirror reflectance caused by the formation of both amorphous and crystalline phases of molybdenum silicide, diffusion of silicon and crystallization of molybdenum layers [2,6]. For that, 0.3 nm-thick B 4 C barriers have been used along with decreasing of the width of Mo layers, and magnetron sputtering has been optimized by increasing the temperature of substrate and bias of its potential.…”
Section: Introductionmentioning
confidence: 99%
“…A detailed discussion on the multilayer physics and deposition techniques can be found in the review papers. [5][6][7][8][9] Here, we mainly focus on methods to tune and manipulate the spectral properties of multilayer optics.…”
Section: Introductionmentioning
confidence: 99%