1989
DOI: 10.1016/0040-6090(89)90706-2
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Preparation and optical properties of thin films of CrO3 and Cr2O3 prepared by the method of chemical spray pyrolysis

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Cited by 45 publications
(17 citation statements)
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“…We also have to note that plain Cr 2 O 3 is long been known to be an exceptionally hard and durable material, which promises good stability of films in devices. 23,24 There are also reports of the possibility of n-type doped Cr 2 O 3 25 , which may open up prospects of fully transparent homojunctions, if the anionic co-doping approch with nitro- gen can equally be employed to enhance transparency. In addition it has already been shown that amorphous Cr 2 O 3 :N can improve organic solar cell performance.…”
mentioning
confidence: 99%
“…We also have to note that plain Cr 2 O 3 is long been known to be an exceptionally hard and durable material, which promises good stability of films in devices. 23,24 There are also reports of the possibility of n-type doped Cr 2 O 3 25 , which may open up prospects of fully transparent homojunctions, if the anionic co-doping approch with nitro- gen can equally be employed to enhance transparency. In addition it has already been shown that amorphous Cr 2 O 3 :N can improve organic solar cell performance.…”
mentioning
confidence: 99%
“…[1] showed an absorption band at 300 nm (4.1 eV) for hydrothermally synthesized Cr 2 O 3 films having a direct band gap according to Tauc formula (αhν) = A(hν − E g ) 1/2 at 3.2 eV. For sprayed Cr 2 O 3 films Misho et al [12] reported a direct energy gap of 3.40 eV and for solvothermal nanocrystalline Cr 2 O 3 [13] a direct bandgap at 3.6 -4.0 eV. Using UV-VIS spectroscopy, Ivanova et al [14] obtained Cr 2 O 3 indirect band gap according to a formula α (ν) = A(hν − E g )…”
Section: Cr O 3 Optical Propertiesmentioning
confidence: 97%
“…Chromium oxide shows different optical and resistivity behaviour due to stoichiometric changes arising from the preparation techniques and parameters used during the deposition process. The thin films can be prepared using various deposition techniques such as electronbeam evaporation, chemical vapour deposition, sputtering, pulse laser deposition, chemical spray pyrolysis and arc ion plating [5,[15][16][17][18][19][20]. Goodlet et al [21] in their investigation of electronic properties of chromium oxide reported band gaps in the range 2.7eV to 2.9eV for reactively sputtered chromium oxide films.…”
Section: Introductionmentioning
confidence: 99%