2000
DOI: 10.1016/s0040-6090(00)01118-4
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Preparation and properties of precursor Ba–Ca–Cu–(O, F) thin films deposited from fluorides for superconducting Tl- and Hg-based films

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Cited by 7 publications
(5 citation statements)
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“…The Hg-based cuprate thin films were fabricated on (100) LaAlO 3 single crystal substrates employing currently adopted two-step process: (1) preparation of approximately 200 nm thick Ba 2 Ca 2 Cu 3 (O, F) x precursor films by the sequential thermal evaporation of BaF 2 , CaF 2 and Cu, and (2) annealing them in Hg-vapour at a high temperature. The details of the precursor film preparation and a very good chemical resistance of the precursor films against the detrimental effect of air were described elsewhere [14]. The fluorine content in the precursor film was investigated using a resonant nuclear reaction method [16].…”
Section: Methodsmentioning
confidence: 99%
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“…The Hg-based cuprate thin films were fabricated on (100) LaAlO 3 single crystal substrates employing currently adopted two-step process: (1) preparation of approximately 200 nm thick Ba 2 Ca 2 Cu 3 (O, F) x precursor films by the sequential thermal evaporation of BaF 2 , CaF 2 and Cu, and (2) annealing them in Hg-vapour at a high temperature. The details of the precursor film preparation and a very good chemical resistance of the precursor films against the detrimental effect of air were described elsewhere [14]. The fluorine content in the precursor film was investigated using a resonant nuclear reaction method [16].…”
Section: Methodsmentioning
confidence: 99%
“…Wu et al used another approach in [10], where Tl in air-stable superconducting Tl y Ba 2 Ca n−1 Cu n O x (y = 1, 2; n = 2, 3) films was replaced by Hg. A few years ago we developed a thin film fabrication process based on an air-stable precursor prepared from BaF 2 and CaF 2 [11][12][13][14]. The halogenation of Hg-1212 thin films by Cl or F was proposed to minimize the detrimental effect of air during Hg-1212 thin film processing [4].…”
Section: Introductionmentioning
confidence: 99%
“…As a precursor, a 200 nm thick Ba-Ca-Cu-(O, F) film was deposited by sequential evaporation of BaF 2 , Cu and CaF 2 with an approximate stoichiometric ratio of Ba:Ca:Cu = 2:2:3. Then the deposition was followed by an ex situ vacuum annealing process at 700 • C at an oxygen partial pressure of 10 −5 Pa, gradually increased to atmospheric pressure in order to decrease the content of fluorine in the precursor film [9].…”
Section: Methodsmentioning
confidence: 99%
“…In this paper we report on the properties of Hg-based cuprate thin films grown on R-plane sapphire with a CeO 2 buffer layer. The air stable precursor Ba-Ca-Cu-(O, F) thin films [9] prepared on the base of fluorides (BaF 2 and CaF 2 ) were used. The films were mercurated with a source of mercury, which was an unreacted pellet of Re-doped Hg-Re-Ba-Ca-Cu.…”
Section: Introductionmentioning
confidence: 99%
“…High-quality MgB 2 thin films are not only especially required for microelectronics applications, but also for various basic studies of material properties. Several methods were so far applied to synthesize MgB 2 films: e-beam evaporation [2,3], thermal deposition [4] and/or pulsed laser deposition [5,6]. Usually Mg-B or B amorphous precursor films are first deposited, which must then be annealed at high temperatures in order to build the MgB 2 structure.…”
Section: Introductionmentioning
confidence: 99%