2018
DOI: 10.2109/jcersj2.17251
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Preparation of {001}<sub>c</sub>-oriented epitaxial (K, Na)NbO<sub>3</sub> thick films by repeated hydrothermal deposition technique

Abstract: {001} c -oriented (K 0.86 Na 0.14 )NbO 3 thick films were prepared at 240°C on (100) c SrRuO 3 //(100)SrTiO 3 substrates by repeated hydrothermal deposition technique. The film thickness was found to increase linearly with the number of deposition cycles, and 60¯m-thick film was obtained after nine repetitions of the deposition. The K/(K+Na) ratio of the deposited thick films, measured by X-ray fluorescence spectroscopy, showed constant values regardless of the number of deposition cycles. Cross-sectional scan… Show more

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Cited by 9 publications
(6 citation statements)
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“…It is already investigated that the film thickness can increase easily by repeating the batch process, maintaining the same composition and crystal structure in the hydrothermal process. [36][37][38] This means that the heat-treated film at 600 °C hardly changed its property by the additional hydrothermal deposition process, maintaining its nonpolarized state. (It is ascertained but not shown here.)…”
Section: Resultsmentioning
confidence: 99%
“…It is already investigated that the film thickness can increase easily by repeating the batch process, maintaining the same composition and crystal structure in the hydrothermal process. [36][37][38] This means that the heat-treated film at 600 °C hardly changed its property by the additional hydrothermal deposition process, maintaining its nonpolarized state. (It is ascertained but not shown here.)…”
Section: Resultsmentioning
confidence: 99%
“…However, it is always challenging to fabricate high‐quality and uniform KNN‐based films with stoichiometric compositions due to the complexity of the film composition and the volatilization of K and Na elements at high temperatures. Nevertheless, several techniques have been utilized to overcome the initial difficulties to prepare the KNN‐based epitaxial films, for example, PLD, RF magnetron sputtering, sol–gel, HT, and metal organic chemical vapor deposition (MOCVD) …”
Section: Epitaxial Filmsmentioning
confidence: 99%
“…29,30) Moreover, low-temperature deposition using the hydrothermal process allows the growth of thicker films due to smaller thermal strain. [31][32][33] In general, the thick film needs high voltage to align the direction of polarization by applying an electric field, called the poling process. 15) However, hydrothermally synthesized (K,Na)NbO 3 film has a self-polarized state in which the polarization direction is self-aligned, as discussed previously.…”
Section: Introductionmentioning
confidence: 99%