2018
DOI: 10.1134/s0020168518110109
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Preparation of Dielectric Films via Thermal Oxidation of MnO2/GaAs

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Cited by 6 publications
(2 citation statements)
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“…During the thermal oxidation of Mn 3 (P 0.1 V 0.9 O 4 ) 2 / GaAs heterostructures the value of n av was less than 0.5, indicating that in this temperature range the determining process is the solid-phase reaction, limited by diffusion in the solid phase [16]. The EAE value of the studied process was somewhat higher (156 kJ/mol) compared with the intrinsic thermal oxidation of GaAs (110 kJ/mol).…”
Section: Resultsmentioning
confidence: 96%
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“…During the thermal oxidation of Mn 3 (P 0.1 V 0.9 O 4 ) 2 / GaAs heterostructures the value of n av was less than 0.5, indicating that in this temperature range the determining process is the solid-phase reaction, limited by diffusion in the solid phase [16]. The EAE value of the studied process was somewhat higher (156 kJ/mol) compared with the intrinsic thermal oxidation of GaAs (110 kJ/mol).…”
Section: Resultsmentioning
confidence: 96%
“…In this study, manganese vanadate-phosphate Mn 3 (P 0.1 V 0.9 O 4 ) was chosen as a chemostimulator-modifier. Manganese oxides are effective chemostimulators of the oxidation processes of A III B V [16]. Vanadate groups VO 4 3-, isostructural to arsenate anions AsO 4…”
Section: Introductionmentioning
confidence: 99%