The paper presents a system for otHgI, crystal growth by the temperature oscillation method. The system has a capability of crystal growing at an excess I, or Hg vapour pressure. Optimum conditions for producing crystals up to 2 cm3 by volume have been established. The crystals grown at an excess I, vapour pressure have higher resistivity and higher drift electron and hole mobilities -pe = 120 om2 V-* s-l and p h = 6 em2 V-' s-l, respee tivel y .